@article{06b668272084406e8c544cdfedb1956b,
title = "ZrO2 Thin Films Grown on Silicon Substrates by Atomic Layer Deposition with Cp2Zr(CH3))2 and Water as Precursors",
keywords = "atomic layer deposition, cyclopentadienyl precursor, dielectric properties, zirconium dioxide, atomic layer deposition, cyclopentadienyl precursor, dielectric properties, zirconium dioxide, atomic layer deposition, cyclopentadienyl precursor, dielectric properties, zirconium dioxide",
author = "Matti Putkonen and Jaakko Niinist{\"o} and Kaupo Kukli and Timo Sajavaara and Maarit Karppinen and Hisao Yamauchi and Lauri Niinist{\"o}",
year = "2003",
language = "English",
volume = "9",
pages = "207--212",
journal = "Chemical Vapor Deposition",
issn = "1521-3862",
publisher = "Wiley",
number = "4",
}