@techreport{bd6cc6acd8a84a89959cb53aa987f570,
title = "White beam synchrotron x-ray topography studies of copper interconnect inducec strain in Si ic processing",
keywords = "semiconductors, synchrotron x-ray topography, semiconductors, synchrotron x-ray topography, semiconductors, synchrotron x-ray topography",
author = "J. Kanatharana and P.J. McNally and T. Tuomi and B.H.W. Toh and D. McNeill and W.M. Chen and J. Riikonen and L. Knuuttila and J.J. P{\'e}rez-Camacho",
year = "2002",
language = "English",
series = "HASYLAB-DESY Annual Report 2001, Part I",
pages = "861--862",
type = "WorkingPaper",
}