Wafer-scale CMOS-compatible graphene Josephson field-effect transistors

Andrey A. Generalov*, Klaara L. Viisanen*, Jorden Senior, Bernardo R. Ferreira, Jian Ma, Mikko Möttönen, Mika Prunnila, Heorhii Bohuslavskyi*

*Tämän työn vastaava kirjoittaja

Tutkimustuotos: LehtiartikkeliArticleScientificvertaisarvioitu

2 Sitaatiot (Scopus)

Abstrakti

Electrostatically tunable Josephson field-effect transistors (JoFETs) are one of the most desired building blocks of quantum electronics. Applications of JoFETs range from parametric amplifiers and superconducting qubits to a variety of integrated superconducting circuits. Here, we report on graphene JoFET devices fabricated with wafer-scale complementary metal-oxide-semiconductor (CMOS)-compatible processing based on chemical-vapor-deposited monolayer graphene encapsulated with atomic-layer-deposited Al2O3 gate oxide, lithographically defined top gate, and evaporated superconducting Ti/Al source, drain, and gate contacts. By optimizing the contact resistance down to ∼170 Ω μm, we observe proximity-induced superconductivity in the JoFET channels with different gate lengths of 150-350 nm. The Josephson junction devices show reproducible critical current I c tunablity with the local top gate. Our JoFETs are in the short diffusive limit with the I c reaching up to ∼3 µA for a 50 µm channel width. Overall, our demonstration of CMOS-compatible two-dimensional (2D) material-based JoFET fabrication process is an important step toward graphene-based integrated quantum circuits.

AlkuperäiskieliEnglanti
Artikkeli012602
Sivut1-6
Sivumäärä6
JulkaisuApplied Physics Letters
Vuosikerta125
Numero1
DOI - pysyväislinkit
TilaJulkaistu - 1 heinäk. 2024
OKM-julkaisutyyppiA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

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