Wafer-Scale Atomic-Layer-Deposition of Er3+- and Yb3+- Doped Gain Materials for Integrated Photonics

Andreas C. Liapis; Vincent Pelgrin; Peng Liu; Xiaoqi Cui; Jose M.A. Rosa; Heli Seppannen; Diao Li; Igor Reduto; Seppo Honkanen; Harri Lipsanen; Zhipei Sun

doi:10.1364/CLEO_SI.2023.STh1O.4

Wafer-Scale Atomic-Layer-Deposition of Er³⁺- and Yb³+- Doped Gain Materials for Integrated Photonics

Andreas C. Liapis^*, Vincent Pelgrin, Peng Liu, Xiaoqi Cui, Jose M.A. Rosa, Heli Seppannen, Diao Li, Igor Reduto, Seppo Honkanen, Harri Lipsanen, Zhipei Sun

^*Tämän työn vastaava kirjoittaja

Tutkimustuotos: Artikkeli kirjassa/konferenssijulkaisussa › Abstract › Scientific › vertaisarvioitu

1 Sitaatiot (Scopus)

Abstrakti

We demonstrate highly-doped Er³⁺ and Yb^{3 +} doped gain media on SiN waveguides by plasma-enhanced atomic layer deposition, showing great potential for integrated lasers and amplifiers.

Alkuperäiskieli	Englanti
DOI - pysyväislinkit	https://doi.org/10.1364/CLEO_SI.2023.STh1O.4
Tila	Julkaistu - 2023
OKM-julkaisutyyppi	Ei sovellu
Tapahtuma	Conference on Lasers and Electro-Optics - San Jose, Yhdysvallat Kesto: 7 toukok. 2023 → 12 toukok. 2023

Conference

Conference	Conference on Lasers and Electro-Optics
Lyhennettä	CLEO
Maa/Alue	Yhdysvallat
Kaupunki	San Jose
Ajanjakso	07/05/2023 → 12/05/2023

Pääsy asiakirjaan

10.1364/CLEO_SI.2023.STh1O.4

Muut tiedostot ja linkit

Linkki julkaisuun Scopuksessa

OtaNano
Rissanen, A. (Manager)
Aalto-yliopisto
Laitteistot/tilat: Facility
OtaNano Nanofab
Repo, P. (Manager) & Rissanen, A. (Other)
OtaNano
Laitteistot/tilat: Facility

Siteeraa tätä

Liapis, A. C., Pelgrin, V., Liu, P., Cui, X., Rosa, J. M. A., Seppannen, H., Li, D., Reduto, I., Honkanen, S., Lipsanen, H., & Sun, Z. (2023). Wafer-Scale Atomic-Layer-Deposition of Er³⁺- and Yb³+- Doped Gain Materials for Integrated Photonics. Abstraktin lähde: Conference on Lasers and Electro-Optics, San Jose, California, Yhdysvallat. https://doi.org/10.1364/CLEO_SI.2023.STh1O.4

@conference{05552524670b400497e869f606349c2e,

title = "Wafer-Scale Atomic-Layer-Deposition of Er3+- and Yb3+- Doped Gain Materials for Integrated Photonics",

abstract = "We demonstrate highly-doped Er3+ and Yb3 + doped gain media on SiN waveguides by plasma-enhanced atomic layer deposition, showing great potential for integrated lasers and amplifiers.",

author = "Liapis, {Andreas C.} and Vincent Pelgrin and Peng Liu and Xiaoqi Cui and Rosa, {Jose M.A.} and Heli Seppannen and Diao Li and Igor Reduto and Seppo Honkanen and Harri Lipsanen and Zhipei Sun",

note = "Publisher Copyright: {\textcopyright} Optica Publishing Group 2023 {\textcopyright} 2023 The Author(s); Conference on Lasers and Electro-Optics, CLEO ; Conference date: 07-05-2023 Through 12-05-2023",

year = "2023",

doi = "10.1364/CLEO_SI.2023.STh1O.4",

language = "English",

}

TY - CONF

T1 - Wafer-Scale Atomic-Layer-Deposition of Er3+- and Yb3+- Doped Gain Materials for Integrated Photonics

AU - Liapis, Andreas C.

AU - Pelgrin, Vincent

AU - Liu, Peng

AU - Cui, Xiaoqi

AU - Rosa, Jose M.A.

AU - Seppannen, Heli

AU - Li, Diao

AU - Reduto, Igor

AU - Honkanen, Seppo

AU - Lipsanen, Harri

AU - Sun, Zhipei

PY - 2023

Y1 - 2023

N2 - We demonstrate highly-doped Er3+ and Yb3 + doped gain media on SiN waveguides by plasma-enhanced atomic layer deposition, showing great potential for integrated lasers and amplifiers.

AB - We demonstrate highly-doped Er3+ and Yb3 + doped gain media on SiN waveguides by plasma-enhanced atomic layer deposition, showing great potential for integrated lasers and amplifiers.

UR - http://www.scopus.com/inward/record.url?scp=85176363689&partnerID=8YFLogxK

U2 - 10.1364/CLEO_SI.2023.STh1O.4

DO - 10.1364/CLEO_SI.2023.STh1O.4

M3 - Abstract

AN - SCOPUS:85176363689

T2 - Conference on Lasers and Electro-Optics

Y2 - 7 May 2023 through 12 May 2023

ER -

Wafer-Scale Atomic-Layer-Deposition of Er3+- and Yb3+- Doped Gain Materials for Integrated Photonics

Abstrakti

Conference

Pääsy asiakirjaan

Muut tiedostot ja linkit

Sormenjälki

Laitteet

OtaNano

OtaNano Nanofab

Siteeraa tätä

Wafer-Scale Atomic-Layer-Deposition of Er³⁺- and Yb³+- Doped Gain Materials for Integrated Photonics