@inproceedings{173cd3ffced144998880fb58bb6d9acc,
title = "Visualisation and finite element modelling of strain fields in silicon due to integrated circuit metallisation",
keywords = "integrated circuits, silicon, strain fields, synchrotron x-ray topography, integrated circuits, silicon, strain fields, synchrotron x-ray topography, integrated circuits, silicon, strain fields, synchrotron x-ray topography",
author = "M. {"}O'Hare{"} and P.J. McNally and D. Lowney and Turkka Tuomi and R. Rantam{\"a}ki and A.N. Danilewsky",
year = "2000",
language = "English",
isbn = "1-86125-129-7",
pages = "89--92",
booktitle = "3rd Int. Conf. on Materials for Microelectronics (MFM2000), Dublin Castle, Ireland, 16-17 October, 2000",
}