Abstrakti
This paper discusses the use of ALD thin films as Bragg mirror structure materials in MEMS Fabry-Perot interferometers in the visible spectral range. Utilizing polyimide sacrificial layer in the FPI fabrication process is also presented as an alternative method to allow higher temperature (T= 300 °C) ALD FPI processing. ALD Al2O 3 and TiO 2 thin films grown at T= 110 °C are optically characterized to determine their performance in the UV - visible range (λ>200nm) and effects of the ALD temperature on the thin film stacks and the FPI process is discussed. Optically simulated 5-layer Bragg mirror stacks consisting of ALD Al2O 3 and TiO 2 for wavelengths between 420 nm and 1000 nm are presented and corresponding MEMS mirror membrane structures are fabricated at T= 110 °C and tested for their release yield properties. As a result, the applicable wavelength range of the low-temperature ALD FPI technology can be defined.
| Alkuperäiskieli | Englanti |
|---|---|
| Otsikko | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V |
| Vuosikerta | 8249 |
| DOI - pysyväislinkit | |
| Tila | Julkaistu - 2012 |
| OKM-julkaisutyyppi | A4 Artikkeli konferenssijulkaisuussa |
| Tapahtuma | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics - San Francisco, Yhdysvallat Kesto: 24 tammik. 2012 → 25 tammik. 2012 Konferenssinumero: 5 |
Conference
| Conference | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics |
|---|---|
| Maa/Alue | Yhdysvallat |
| Kaupunki | San Francisco |
| Ajanjakso | 24/01/2012 → 25/01/2012 |