Thermal Atomic Layer Etching of Aluminum Oxide (Al₂O₃) Using Sequential Exposures of Niobium Pentafluoride (NbF₅) and Carbon Tetrachloride (CCl₄): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism

Varun Sharma^*, Tom Blomberg, Suvi Haukka, Michael E. Givens, Marko Tuominen, Mikko Ritala^*, Simon Elliott

^*Tämän työn vastaava kirjoittaja

Tutkimustuotos: Lehtiartikkeli › Article › Scientific › vertaisarvioitu

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Thermal Atomic Layer Etching of Aluminum Oxide (Al2O3) Using Sequential Exposures of Niobium Pentafluoride (NbF5) and Carbon Tetrachloride (CCl4): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism
Sharma, V. (Creator), Elliott, S. (Creator), Ritala, M. (Creator), Blomberg, T. (Creator), Haukka, S. (Creator), Givens, M. E. (Creator) & Tuominen, M. (Creator), figshare, 9 huhtik. 2021
DOI - pysyväislinkki: 10.1021/acs.chemmater.1c00142.s002, https://figshare.com/articles/dataset/Thermal_Atomic_Layer_Etching_of_Aluminum_Oxide_Al_sub_2_sub_O_sub_3_sub_Using_Sequential_Exposures_of_Niobium_Pentafluoride_NbF_sub_5_sub_and_Carbon_Tetrachloride_CCl_sub_4_sub_A_Combined_Experimental_and_Density_Functional_Theory_Study_of_/14394308?backTo=/collections/Thermal_Atomic_Layer_Etching_of_Aluminum_Oxide_Al_sub_2_sub_O_sub_3_sub_Using_Sequential_Exposures_of_Niobium_Pentafluoride_NbF_sub_5_sub_and_Carbon_Tetrachloride_CCl_sub_4_sub_A_Combined_Experimental_and_Density_Functional_Theory_Study_of_/5370716?backTo=/collections/Thermal_Atomic_Layer_Etching_of_Aluminum_Oxide_Al_sub_2_sub_O_sub_3_sub_Using_Sequential_Exposures_of_Niobium_Pentafluoride_NbF_sub_5_sub_and_Carbon_Tetrachloride_CCl_sub_4_sub_A_Combined_Experimental_and_Density_Functional_Theory_Study_of_/5370716
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