TY - JOUR
T1 - Suppressed Fermi Level Pinning and Wide-Range Tunable Schottky Barrier in CrX3 (X = I, Br)/2D Metal Contacts
AU - Hu, Yanmei
AU - Hu, Xiaohui
AU - Wang, Yifeng
AU - Lu, Chunhua
AU - Krasheninnikov, Arkady V.
AU - Chen, Zhongfang
AU - Sun, Litao
N1 - Funding Information:
This work is supported in China by the National Natural Science Foundation of China (No.11604047), the Natural Science Foundation of Jiangsu Province (No. BK20160694), Jiangsu Planned Projects for Postdoctoral Research Funds (No. 2019K010A), the Priority Academic Program Development of Jiangsu Higher Education Institutions (PAPD), the Fundamental Research Funds for the Central Universities, and the open research fund of the Key Laboratory of MEMS of Ministry of Education, Southeast University. AVK acknowledges funding from the German Research Foundation (DFG), project KR 4866/6-1 and the collaborative research center “Chemistry of Synthetic 2D Materials” SFB-1415-417590517. We are thankful for the computational resources from the High-Performance Computing Center of Nanjing Tech University, and the National Supercomputer Center in Tianjin.
Publisher Copyright:
© 2023 American Chemical Society.
PY - 2023/3/23
Y1 - 2023/3/23
N2 - CrX3 (X = I, Br) monolayers exhibit outstanding performance in spintronic devices. However, the Schottky barrier at the CrX3/electrode interface severely impedes the charge injection efficiency. Herein, we propose two-dimensional (2D) metals as electrodes to form van der Waals (vdW) contact with CrX3 monolayers and systematically explore the contact properties of CrX3/metal by density functional theory (DFT) calculations. The results demonstrate that the strongly suppressed Fermi level pinning (FLP) effect and the wide-range tunable Schottky barrier can be achieved in CrX3/metal contacts. Specifically, the n-type and the p-type Schottky contacts can be realized in CrX3/metal contacts by choosing 2D metal electrodes with different work functions. Importantly, the pinning factors for CrX3/metal contacts are exceptionally larger than other commonly studied 2D semiconductors, indicating the strongly suppressed FLP in CrX3/metal contacts, which leads to the wide-range tunable Schottky barrier. Our findings provide guidance to the choice of electrodes and promote the development of CrX3-based spin devices.
AB - CrX3 (X = I, Br) monolayers exhibit outstanding performance in spintronic devices. However, the Schottky barrier at the CrX3/electrode interface severely impedes the charge injection efficiency. Herein, we propose two-dimensional (2D) metals as electrodes to form van der Waals (vdW) contact with CrX3 monolayers and systematically explore the contact properties of CrX3/metal by density functional theory (DFT) calculations. The results demonstrate that the strongly suppressed Fermi level pinning (FLP) effect and the wide-range tunable Schottky barrier can be achieved in CrX3/metal contacts. Specifically, the n-type and the p-type Schottky contacts can be realized in CrX3/metal contacts by choosing 2D metal electrodes with different work functions. Importantly, the pinning factors for CrX3/metal contacts are exceptionally larger than other commonly studied 2D semiconductors, indicating the strongly suppressed FLP in CrX3/metal contacts, which leads to the wide-range tunable Schottky barrier. Our findings provide guidance to the choice of electrodes and promote the development of CrX3-based spin devices.
UR - http://www.scopus.com/inward/record.url?scp=85149945799&partnerID=8YFLogxK
U2 - 10.1021/acs.jpclett.3c00354
DO - 10.1021/acs.jpclett.3c00354
M3 - Article
C2 - 36912604
AN - SCOPUS:85149945799
SN - 1948-7185
VL - 14
SP - 2807
EP - 2815
JO - Journal of Physical Chemistry Letters
JF - Journal of Physical Chemistry Letters
IS - 11
ER -