Supported Two-Dimensional Materials under Ion Irradiation: The Substrate Governs Defect Production

Tutkimustuotos: Lehtiartikkelivertaisarvioitu

Standard

Supported Two-Dimensional Materials under Ion Irradiation : The Substrate Governs Defect Production. / Kretschmer, Silvan; Maslov, Mikhail; Ghaderzadeh, Sadegh; Ghorbani-Asl, Mahdi; Hlawacek, Gregor; Krasheninnikov, Arkady V.

julkaisussa: ACS Applied Materials and Interfaces, Vuosikerta 10, Nro 36, 12.09.2018, s. 30827-30836.

Tutkimustuotos: Lehtiartikkelivertaisarvioitu

Harvard

APA

Vancouver

Author

Kretschmer, Silvan ; Maslov, Mikhail ; Ghaderzadeh, Sadegh ; Ghorbani-Asl, Mahdi ; Hlawacek, Gregor ; Krasheninnikov, Arkady V. / Supported Two-Dimensional Materials under Ion Irradiation : The Substrate Governs Defect Production. Julkaisussa: ACS Applied Materials and Interfaces. 2018 ; Vuosikerta 10, Nro 36. Sivut 30827-30836.

Bibtex - Lataa

@article{4fd591c995fc456e983788b739e485a5,
title = "Supported Two-Dimensional Materials under Ion Irradiation: The Substrate Governs Defect Production",
abstract = "Focused ion beams perfectly suit for patterning two-dimensional (2D) materials, but the optimization of irradiation parameters requires full microscopic understanding of defect production mechanisms. In contrast to freestanding 2D systems, the details of damage creation in supported 2D materials are not fully understood, whereas the majority of experiments have been carried out for 2D targets deposited on substrates. Here, we suggest a universal and computationally efficient scheme to model the irradiation of supported 2D materials, which combines analytical potential molecular dynamics with Monte Carlo simulations and makes it possible to independently assess the contributions to the damage from backscattered ions and atoms sputtered from the substrate. Using the scheme, we study the defect production in graphene and MoS2 sheets, which are the two most important and wide-spread 2D materials, deposited on a SiO2 substrate. For helium and neon ions with a wide range of initial ion energies including those used in a commercial helium ion microscope (HIM), we demonstrate that depending on the ion energy and mass, the defect production in 2D systems can be dominated by backscattered ions and sputtered substrate atoms rather than by the direct ion impacts and that the amount of damage in 2D materials heavily depends on whether a substrate is present or not. We also study the factors which limit the spatial resolution of the patterning process. Our results, which agree well with the available experimental data, provide not only insights into defect production but also quantitative information, which can be used for the minimization of damage during imaging in HIM or optimization of the patterning process.",
keywords = "atomistic simulations, defects, He ion microscopy, ion irradiation, sputtering, two-dimensional materials",
author = "Silvan Kretschmer and Mikhail Maslov and Sadegh Ghaderzadeh and Mahdi Ghorbani-Asl and Gregor Hlawacek and Krasheninnikov, {Arkady V.}",
year = "2018",
month = "9",
day = "12",
doi = "10.1021/acsami.8b08471",
language = "English",
volume = "10",
pages = "30827--30836",
journal = "ACS Applied Materials and Interfaces",
issn = "1944-8244",
publisher = "AMERICAN CHEMICAL SOCIETY",
number = "36",

}

RIS - Lataa

TY - JOUR

T1 - Supported Two-Dimensional Materials under Ion Irradiation

T2 - The Substrate Governs Defect Production

AU - Kretschmer, Silvan

AU - Maslov, Mikhail

AU - Ghaderzadeh, Sadegh

AU - Ghorbani-Asl, Mahdi

AU - Hlawacek, Gregor

AU - Krasheninnikov, Arkady V.

PY - 2018/9/12

Y1 - 2018/9/12

N2 - Focused ion beams perfectly suit for patterning two-dimensional (2D) materials, but the optimization of irradiation parameters requires full microscopic understanding of defect production mechanisms. In contrast to freestanding 2D systems, the details of damage creation in supported 2D materials are not fully understood, whereas the majority of experiments have been carried out for 2D targets deposited on substrates. Here, we suggest a universal and computationally efficient scheme to model the irradiation of supported 2D materials, which combines analytical potential molecular dynamics with Monte Carlo simulations and makes it possible to independently assess the contributions to the damage from backscattered ions and atoms sputtered from the substrate. Using the scheme, we study the defect production in graphene and MoS2 sheets, which are the two most important and wide-spread 2D materials, deposited on a SiO2 substrate. For helium and neon ions with a wide range of initial ion energies including those used in a commercial helium ion microscope (HIM), we demonstrate that depending on the ion energy and mass, the defect production in 2D systems can be dominated by backscattered ions and sputtered substrate atoms rather than by the direct ion impacts and that the amount of damage in 2D materials heavily depends on whether a substrate is present or not. We also study the factors which limit the spatial resolution of the patterning process. Our results, which agree well with the available experimental data, provide not only insights into defect production but also quantitative information, which can be used for the minimization of damage during imaging in HIM or optimization of the patterning process.

AB - Focused ion beams perfectly suit for patterning two-dimensional (2D) materials, but the optimization of irradiation parameters requires full microscopic understanding of defect production mechanisms. In contrast to freestanding 2D systems, the details of damage creation in supported 2D materials are not fully understood, whereas the majority of experiments have been carried out for 2D targets deposited on substrates. Here, we suggest a universal and computationally efficient scheme to model the irradiation of supported 2D materials, which combines analytical potential molecular dynamics with Monte Carlo simulations and makes it possible to independently assess the contributions to the damage from backscattered ions and atoms sputtered from the substrate. Using the scheme, we study the defect production in graphene and MoS2 sheets, which are the two most important and wide-spread 2D materials, deposited on a SiO2 substrate. For helium and neon ions with a wide range of initial ion energies including those used in a commercial helium ion microscope (HIM), we demonstrate that depending on the ion energy and mass, the defect production in 2D systems can be dominated by backscattered ions and sputtered substrate atoms rather than by the direct ion impacts and that the amount of damage in 2D materials heavily depends on whether a substrate is present or not. We also study the factors which limit the spatial resolution of the patterning process. Our results, which agree well with the available experimental data, provide not only insights into defect production but also quantitative information, which can be used for the minimization of damage during imaging in HIM or optimization of the patterning process.

KW - atomistic simulations

KW - defects

KW - He ion microscopy

KW - ion irradiation

KW - sputtering

KW - two-dimensional materials

UR - http://www.scopus.com/inward/record.url?scp=85052754868&partnerID=8YFLogxK

U2 - 10.1021/acsami.8b08471

DO - 10.1021/acsami.8b08471

M3 - Article

AN - SCOPUS:85052754868

VL - 10

SP - 30827

EP - 30836

JO - ACS Applied Materials and Interfaces

JF - ACS Applied Materials and Interfaces

SN - 1944-8244

IS - 36

ER -

ID: 29104653