Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD: Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD"

Tutkimustuotos: Lehtiartikkeli

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Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD". / Ahvenniemi, Esko; Akbashev, Andrew R.; Ali, Saima; Bechelany, Mikhael; Berdova, Maria; Boyadjiev, Stefan; Cameron, David C.; Chen, Rong; Chubarov, Mikhail; Cremers, Veronique; Devi, Anjana; Drozd, Viktor; Elnikova, Liliya; Gottardi, Gloria; Grigoras, Kestutis; Hausmann, Dennis M.; Hwang, Cheol Seong; Jen, Shih Hui; Kallio, Tanja; Kanervo, Jaana; Khmelnitskiy, Ivan; Kim, Do Han; Klibanov, Lev; Koshtyal, Yury; Krause, A. Outi I.; Kuhs, Jakob; Kärkkänen, Irina; Kääriäinen, Marja Leena; Kääriäinen, Tommi; Lamagna, Luca; Łapicki, Adam A.; Leskelä, Markku; Lipsanen, Harri; Lyytinen, Jussi; Malkov, Anatoly; Malygin, Anatoly; Mennad, Abdelkader; Militzer, Christian; Molarius, Jyrki; Norek, Małgorzata; Özgit-Akgün, Çaǧla; Panov, Mikhail; Pedersen, Henrik; Piallat, Fabien; Popov, Georgi; Puurunen, Riikka L.; Rampelberg, Geert; Ras, Robin H A; Rauwel, Erwan; Roozeboom, Fred; Sajavaara, Timo; Salami, Hossein; Savin, Hele; Schneider, Nathanaelle; Seidel, Thomas E.; Sundqvist, Jonas; Suyatin, Dmitry B.; Törndahl, Tobias; Van Ommen, J. Ruud; Wiemer, Claudia; Ylivaara, Oili M E; Yurkevich, Oksana.

julkaisussa: JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A, Vuosikerta 35, Nro 1, 010801, 01.01.2017, s. 1-13.

Tutkimustuotos: Lehtiartikkeli

Harvard

Ahvenniemi, E, Akbashev, AR, Ali, S, Bechelany, M, Berdova, M, Boyadjiev, S, Cameron, DC, Chen, R, Chubarov, M, Cremers, V, Devi, A, Drozd, V, Elnikova, L, Gottardi, G, Grigoras, K, Hausmann, DM, Hwang, CS, Jen, SH, Kallio, T, Kanervo, J, Khmelnitskiy, I, Kim, DH, Klibanov, L, Koshtyal, Y, Krause, AOI, Kuhs, J, Kärkkänen, I, Kääriäinen, ML, Kääriäinen, T, Lamagna, L, Łapicki, AA, Leskelä, M, Lipsanen, H, Lyytinen, J, Malkov, A, Malygin, A, Mennad, A, Militzer, C, Molarius, J, Norek, M, Özgit-Akgün, Ç, Panov, M, Pedersen, H, Piallat, F, Popov, G, Puurunen, RL, Rampelberg, G, Ras, RHA, Rauwel, E, Roozeboom, F, Sajavaara, T, Salami, H, Savin, H, Schneider, N, Seidel, TE, Sundqvist, J, Suyatin, DB, Törndahl, T, Van Ommen, JR, Wiemer, C, Ylivaara, OME & Yurkevich, O 2017, 'Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD: Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD"', JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A, Vuosikerta. 35, Nro 1, 010801, Sivut 1-13. https://doi.org/10.1116/1.4971389

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Author

Ahvenniemi, Esko ; Akbashev, Andrew R. ; Ali, Saima ; Bechelany, Mikhael ; Berdova, Maria ; Boyadjiev, Stefan ; Cameron, David C. ; Chen, Rong ; Chubarov, Mikhail ; Cremers, Veronique ; Devi, Anjana ; Drozd, Viktor ; Elnikova, Liliya ; Gottardi, Gloria ; Grigoras, Kestutis ; Hausmann, Dennis M. ; Hwang, Cheol Seong ; Jen, Shih Hui ; Kallio, Tanja ; Kanervo, Jaana ; Khmelnitskiy, Ivan ; Kim, Do Han ; Klibanov, Lev ; Koshtyal, Yury ; Krause, A. Outi I. ; Kuhs, Jakob ; Kärkkänen, Irina ; Kääriäinen, Marja Leena ; Kääriäinen, Tommi ; Lamagna, Luca ; Łapicki, Adam A. ; Leskelä, Markku ; Lipsanen, Harri ; Lyytinen, Jussi ; Malkov, Anatoly ; Malygin, Anatoly ; Mennad, Abdelkader ; Militzer, Christian ; Molarius, Jyrki ; Norek, Małgorzata ; Özgit-Akgün, Çaǧla ; Panov, Mikhail ; Pedersen, Henrik ; Piallat, Fabien ; Popov, Georgi ; Puurunen, Riikka L. ; Rampelberg, Geert ; Ras, Robin H A ; Rauwel, Erwan ; Roozeboom, Fred ; Sajavaara, Timo ; Salami, Hossein ; Savin, Hele ; Schneider, Nathanaelle ; Seidel, Thomas E. ; Sundqvist, Jonas ; Suyatin, Dmitry B. ; Törndahl, Tobias ; Van Ommen, J. Ruud ; Wiemer, Claudia ; Ylivaara, Oili M E ; Yurkevich, Oksana. / Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD". Julkaisussa: JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 2017 ; Vuosikerta 35, Nro 1. Sivut 1-13.

Bibtex - Lataa

@article{6cccf6bdf68b4ae48eeb1e19fce12529,
title = "Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the {"}Virtual Project on the History of ALD: Recommended reading list of early publications on atomic layer deposition - Outcome of the {"}Virtual Project on the History of ALD{"}",
abstract = "Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name {"}molecular layering{"} (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.",
author = "Esko Ahvenniemi and Akbashev, {Andrew R.} and Saima Ali and Mikhael Bechelany and Maria Berdova and Stefan Boyadjiev and Cameron, {David C.} and Rong Chen and Mikhail Chubarov and Veronique Cremers and Anjana Devi and Viktor Drozd and Liliya Elnikova and Gloria Gottardi and Kestutis Grigoras and Hausmann, {Dennis M.} and Hwang, {Cheol Seong} and Jen, {Shih Hui} and Tanja Kallio and Jaana Kanervo and Ivan Khmelnitskiy and Kim, {Do Han} and Lev Klibanov and Yury Koshtyal and Krause, {A. Outi I.} and Jakob Kuhs and Irina K{\"a}rkk{\"a}nen and K{\"a}{\"a}ri{\"a}inen, {Marja Leena} and Tommi K{\"a}{\"a}ri{\"a}inen and Luca Lamagna and Łapicki, {Adam A.} and Markku Leskel{\"a} and Harri Lipsanen and Jussi Lyytinen and Anatoly Malkov and Anatoly Malygin and Abdelkader Mennad and Christian Militzer and Jyrki Molarius and Małgorzata Norek and {\cC}aǧla {\"O}zgit-Akg{\"u}n and Mikhail Panov and Henrik Pedersen and Fabien Piallat and Georgi Popov and Puurunen, {Riikka L.} and Geert Rampelberg and Ras, {Robin H A} and Erwan Rauwel and Fred Roozeboom and Timo Sajavaara and Hossein Salami and Hele Savin and Nathanaelle Schneider and Seidel, {Thomas E.} and Jonas Sundqvist and Suyatin, {Dmitry B.} and Tobias T{\"o}rndahl and {Van Ommen}, {J. Ruud} and Claudia Wiemer and Ylivaara, {Oili M E} and Oksana Yurkevich",
year = "2017",
month = "1",
day = "1",
doi = "10.1116/1.4971389",
language = "English",
volume = "35",
pages = "1--13",
journal = "JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "1",

}

RIS - Lataa

TY - JOUR

T1 - Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD

T2 - Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD"

AU - Ahvenniemi, Esko

AU - Akbashev, Andrew R.

AU - Ali, Saima

AU - Bechelany, Mikhael

AU - Berdova, Maria

AU - Boyadjiev, Stefan

AU - Cameron, David C.

AU - Chen, Rong

AU - Chubarov, Mikhail

AU - Cremers, Veronique

AU - Devi, Anjana

AU - Drozd, Viktor

AU - Elnikova, Liliya

AU - Gottardi, Gloria

AU - Grigoras, Kestutis

AU - Hausmann, Dennis M.

AU - Hwang, Cheol Seong

AU - Jen, Shih Hui

AU - Kallio, Tanja

AU - Kanervo, Jaana

AU - Khmelnitskiy, Ivan

AU - Kim, Do Han

AU - Klibanov, Lev

AU - Koshtyal, Yury

AU - Krause, A. Outi I.

AU - Kuhs, Jakob

AU - Kärkkänen, Irina

AU - Kääriäinen, Marja Leena

AU - Kääriäinen, Tommi

AU - Lamagna, Luca

AU - Łapicki, Adam A.

AU - Leskelä, Markku

AU - Lipsanen, Harri

AU - Lyytinen, Jussi

AU - Malkov, Anatoly

AU - Malygin, Anatoly

AU - Mennad, Abdelkader

AU - Militzer, Christian

AU - Molarius, Jyrki

AU - Norek, Małgorzata

AU - Özgit-Akgün, Çaǧla

AU - Panov, Mikhail

AU - Pedersen, Henrik

AU - Piallat, Fabien

AU - Popov, Georgi

AU - Puurunen, Riikka L.

AU - Rampelberg, Geert

AU - Ras, Robin H A

AU - Rauwel, Erwan

AU - Roozeboom, Fred

AU - Sajavaara, Timo

AU - Salami, Hossein

AU - Savin, Hele

AU - Schneider, Nathanaelle

AU - Seidel, Thomas E.

AU - Sundqvist, Jonas

AU - Suyatin, Dmitry B.

AU - Törndahl, Tobias

AU - Van Ommen, J. Ruud

AU - Wiemer, Claudia

AU - Ylivaara, Oili M E

AU - Yurkevich, Oksana

PY - 2017/1/1

Y1 - 2017/1/1

N2 - Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.

AB - Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.

UR - http://www.scopus.com/inward/record.url?scp=85007005785&partnerID=8YFLogxK

U2 - 10.1116/1.4971389

DO - 10.1116/1.4971389

M3 - Review Article

VL - 35

SP - 1

EP - 13

JO - JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A

JF - JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A

SN - 0734-2101

IS - 1

M1 - 010801

ER -

ID: 10347870