Reversible Photoswitching Function in Atomic/Molecular-Layer-Deposited ZnO:Azobenzene Superlattice Thin Films

Aida Khayyami, Maarit Karppinen*

*Tämän työn vastaava kirjoittaja

Tutkimustuotos: LehtiartikkeliArticleScientificvertaisarvioitu

12 Sitaatiot (Scopus)
100 Lataukset (Pure)

Abstrakti

We report new types of reversibly photoresponsive ZnO:azobenzene superlattice thin films fabricated through atomic/molecular-layer deposition (ALD/MLD) from diethylzinc, water, and 4,4′-azobenzene dicarboxylic acid precursors. In these ultrathin films, crystalline ZnO layers are interspersed with monomolecular photoactive azobenzene dicarboxylate layers. The thickness of the individual ZnO layers is precisely controlled by the number (m) of ALD cycles applied between two subsequent MLD cycles for the azobenzene layers; in our {[(Zn-O)m+(Zn-O2-C-C6H4-N=N-C6H4-C-O2)]n+(Zn-O)m} samples, m ranges from 0 to 240. The photoresponsive behavior of the films is demonstrated with ultraviolet-visible spectroscopy; all the films are found to be photoreactive upon 360 nm irradiation, the kinetics of the resultant trans-cis photoisomerization somewhat depending on the superlattice structure. The reversibility of the photoisomerization reaction is then confirmed with a subsequent thermal treatment. Our work thus provides proof-of-concept evidence of the suitability of the ALD/MLD technology for the implementation of photoactive moieties such as azobenzene within an inorganic matrix as an attractive new methodology for creating novel light-switchable functional materials.

AlkuperäiskieliEnglanti
Artikkeli1
Sivut5904−5911
Sivumäärä8
JulkaisuChemistry of Materials
Vuosikerta30
Numero17
DOI - pysyväislinkit
TilaJulkaistu - 17 elokuuta 2018
OKM-julkaisutyyppiA1 Julkaistu artikkeli, soviteltu

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