Reconstruction and intermixing in thin Ge layers on Si(001)

Laura Nurminen, Francesca Tavazza, David P. Landau, Antti Kuronen, Kimmo Kaski

    Tutkimustuotos: LehtiartikkeliArticleScientificvertaisarvioitu

    16 Sitaatiot (Scopus)

    Abstrakti

    In this work the Monte Carlo method with an empirical potential model for atomic interactions is applied to study reconstruction and intermixing at a Ge-covered Si(001) surface. We investigate the structure and energetics of the 2xn reconstruction which serves as a strain-relief mechanism. The optimal value of n is found to be strongly dependent on the thickness of the Ge overlayer. Si-Ge intermixing is studied using a direct simulation method which includes entropic effects. Ge occupation probabilities in subsurface layers are evaluated as a function of Ge coverage at different temperatures. The results show that strain-relief driven intermixing has a pronounced effect on the surface reconstruction once the Ge coverage reaches a full layer. We also evaluate the effect of temperature on the distribution of Ge in subsurface layers and discuss effects due to kinetic limitations. In agreement with experiments, the study provides a description of the interplay between reconstruction and intermixing at Ge-covered Si(001).
    AlkuperäiskieliEnglanti
    Artikkeli085326
    Sivumäärä10
    JulkaisuPhysical Review B
    Vuosikerta68
    Numero8
    DOI - pysyväislinkit
    TilaJulkaistu - 2003
    OKM-julkaisutyyppiA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

    Tutkimusalat

    • Germanium
    • Monte Carlo
    • Silicon
    • thin layers

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