Precise chemical analysis developement for Silicon water after rapid thermal processing

D. Lioubtchenko; T.A. Brianteseva; Z.M. Lebedeva; I.A. Markov; M. Nolan; T.S. Perova; R.A. Moore

Precise chemical analysis developement for Silicon water after rapid thermal processing

D. Lioubtchenko, T.A. Brianteseva, Z.M. Lebedeva, I.A. Markov, M. Nolan, T.S. Perova, R.A. Moore

Tutkimustuotos: Lehtiartikkeli › Article › Scientific › vertaisarvioitu

4 Sitaatiot (Scopus)

Alkuperäiskieli	Englanti
Sivut	21-25
Julkaisu	Applied Surface Science
Numero	156
Tila	Julkaistu - 2000
OKM-julkaisutyyppi	A1 Julkaistu artikkeli, soviteltu

Tutkimusalat

photometry
rapid thermal processing
silicon

Siteeraa tätä

@article{c843a0160e48417bb9b7d846490a901b,

title = "Precise chemical analysis developement for Silicon water after rapid thermal processing",

keywords = "photometry, rapid thermal processing, silicon, photometry, rapid thermal processing, silicon, photometry, rapid thermal processing, silicon",

author = "D. Lioubtchenko and T.A. Brianteseva and Z.M. Lebedeva and I.A. Markov and M. Nolan and T.S. Perova and R.A. Moore",

year = "2000",

language = "English",

pages = "21--25",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier Science B.V.",

number = "156",

}

TY - JOUR

T1 - Precise chemical analysis developement for Silicon water after rapid thermal processing

AU - Lioubtchenko, D.

AU - Brianteseva, T.A.

AU - Lebedeva, Z.M.

AU - Markov, I.A.

AU - Nolan, M.

AU - Perova, T.S.

AU - Moore, R.A.

PY - 2000

Y1 - 2000

KW - photometry

KW - rapid thermal processing

KW - silicon

KW - photometry

KW - rapid thermal processing

KW - silicon

KW - photometry

KW - rapid thermal processing

KW - silicon

M3 - Article

SP - 21

EP - 25

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

IS - 156

ER -