(poster) Fast-diffusing interstitial nickel in silicon

Jeanette Lindroos; David P. Fenning; Daniel J. Backlund; Erik Verlage; Angelika Gorgulla; Stefan K. Estreicher; Hele Savin; Tonio Buonassisi

(poster) Fast-diffusing interstitial nickel in silicon

Jeanette Lindroos
, David P. Fenning
, Daniel J. Backlund
, Erik Verlage
, Angelika Gorgulla
, Stefan K. Estreicher
, Hele Savin
, Tonio Buonassisi

Electron Physics Group (EPG)

Tutkimustuotos: Artikkeli kirjassa/konferenssijulkaisussa › Abstract › Scientific › vertaisarvioitu

Alkuperäiskieli	Englanti
Tila	Julkaistu - 2013
OKM-julkaisutyyppi	Ei sovellu
Tapahtuma	Conference on Gettering and Defect Engineering in Semiconductor Technology - Oxford, Iso-Britannia Kesto: 22 heinäk. 2013 → 27 heinäk. 2013 Konferenssinumero: 15

Conference

Conference	Conference on Gettering and Defect Engineering in Semiconductor Technology
Lyhennettä	GADEST
Maa/Alue	Iso-Britannia
Kaupunki	Oxford
Ajanjakso	22/07/2013 → 27/07/2013

Siteeraa tätä

@conference{a45b3a92a347480eb54a9fe9ea31c936,

title = "(poster) Fast-diffusing interstitial nickel in silicon",

author = "Jeanette Lindroos and Fenning, \{David P.\} and Backlund, \{Daniel J.\} and Erik Verlage and Angelika Gorgulla and Estreicher, \{Stefan K.\} and Hele Savin and Tonio Buonassisi",

year = "2013",

language = "English",

note = "Conference on Gettering and Defect Engineering in Semiconductor Technology, GADEST ; Conference date: 22-07-2013 Through 27-07-2013",

}

TY - CONF

T1 - (poster) Fast-diffusing interstitial nickel in silicon

AU - Lindroos, Jeanette

AU - Fenning, David P.

AU - Backlund, Daniel J.

AU - Verlage, Erik

AU - Gorgulla, Angelika

AU - Estreicher, Stefan K.

AU - Savin, Hele

AU - Buonassisi, Tonio

N1 - Conference code: 15

PY - 2013

Y1 - 2013

M3 - Abstract

T2 - Conference on Gettering and Defect Engineering in Semiconductor Technology

Y2 - 22 July 2013 through 27 July 2013

ER -