Organic-Inorganic Thin Films from TiCl4 and 4-Aminophenol Precursors: A Model Case of ALD/MLD Hybrid-Material Growth?

Pia Sundberg; Maarit Karppinen

doi:10.1002/ejic.201400081

Organic-Inorganic Thin Films from TiCl4 and 4-Aminophenol Precursors: A Model Case of ALD/MLD Hybrid-Material Growth?

Pia Sundberg, Maarit Karppinen^*

^*Tämän työn vastaava kirjoittaja

Tutkimustuotos: Lehtiartikkeli › Editorial › Scientific

Abstrakti

Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti-O-C6H4-N=)(n)-type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl4 and 4-aminophenol as precursors.

Alkuperäiskieli	Englanti
Sivut	950-950
Sivumäärä	1
Julkaisu	European Journal of Inorganic Chemistry
Vuosikerta	2014
Numero	6
DOI - pysyväislinkit	https://doi.org/10.1002/ejic.201400081
Tila	Julkaistu - helmik. 2014
OKM-julkaisutyyppi	B1 Kirjoitus tieteellisessä aikakauslehdessä

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10.1002/ejic.201400081

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title = "Organic-Inorganic Thin Films from TiCl4 and 4-Aminophenol Precursors: A Model Case of ALD/MLD Hybrid-Material Growth?",

abstract = "Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti-O-C6H4-N=)(n)-type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl4 and 4-aminophenol as precursors.",

author = "Pia Sundberg and Maarit Karppinen",

year = "2014",

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doi = "10.1002/ejic.201400081",

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T1 - Organic-Inorganic Thin Films from TiCl4 and 4-Aminophenol Precursors

T2 - A Model Case of ALD/MLD Hybrid-Material Growth?

AU - Sundberg, Pia

AU - Karppinen, Maarit

PY - 2014/2

Y1 - 2014/2

N2 - Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti-O-C6H4-N=)(n)-type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl4 and 4-aminophenol as precursors.

AB - Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti-O-C6H4-N=)(n)-type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl4 and 4-aminophenol as precursors.

U2 - 10.1002/ejic.201400081

DO - 10.1002/ejic.201400081

M3 - Editorial

SN - 1434-1948

VL - 2014

SP - 950

EP - 950

JO - European Journal of Inorganic Chemistry

JF - European Journal of Inorganic Chemistry

IS - 6

ER -

Organic-Inorganic Thin Films from TiCl4 and 4-Aminophenol Precursors: A Model Case of ALD/MLD Hybrid-Material Growth?

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