(oral talk) Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage

Kexun Chen; Olli Setälä; Behrad Radfar; Udo Kroth; Ville Vähänissi; Hele Savin

(oral talk) Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage

Kexun Chen^*, Olli Setälä, Behrad Radfar, Udo Kroth, Ville Vähänissi, Hele Savin

^*Tämän työn vastaava kirjoittaja

Tutkimustuotos: Artikkeli kirjassa/konferenssijulkaisussa › Abstract › Scientific › vertaisarvioitu

Alkuperäiskieli	Englanti
Tila	Julkaistu - 2022
OKM-julkaisutyyppi	Ei sovellu
Tapahtuma	Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage - Mondsee, Itävalta Kesto: 14 syysk. 2022 → 14 syysk. 2022

Conference

Conference	Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage
Maa/Alue	Itävalta
Kaupunki	Mondsee
Ajanjakso	14/09/2022 → 14/09/2022

Siteeraa tätä

Chen, K., Setälä, O., Radfar, B., Kroth, U., Vähänissi, V., & Savin, H. (2022). (oral talk) Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage. Abstraktin lähde: Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage, Mondsee, Itävalta.

Chen, Kexun ; Setälä, Olli ; Radfar, Behrad et al. / (oral talk) Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage. Abstraktin lähde: Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage, Mondsee, Itävalta.

@conference{7e4c6dcabc3843febb2859d02014d102,

title = "(oral talk) Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage",

author = "Kexun Chen and Olli Set{\"a}l{\"a} and Behrad Radfar and Udo Kroth and Ville V{\"a}h{\"a}nissi and Hele Savin",

year = "2022",

language = "English",

note = "Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage ; Conference date: 14-09-2022 Through 14-09-2022",

}

Chen, K , Setälä, O , Radfar, B, Kroth, U, Vähänissi, V & Savin, H 2022, '(oral talk) Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage', Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage, Mondsee, Itävalta, 14/09/2022 - 14/09/2022.

(oral talk) Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage. / Chen, Kexun ; Setälä, Olli ; Radfar, Behrad et al.
2022. Abstraktin lähde: Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage, Mondsee, Itävalta.

Tutkimustuotos: Artikkeli kirjassa/konferenssijulkaisussa › Abstract › Scientific › vertaisarvioitu

TY - CONF

T1 - (oral talk) Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage

AU - Chen, Kexun

AU - Setälä, Olli

AU - Radfar, Behrad

AU - Kroth, Udo

AU - Vähänissi, Ville

AU - Savin, Hele

PY - 2022

Y1 - 2022

M3 - Abstract

T2 - Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage

Y2 - 14 September 2022 through 14 September 2022

ER -

Chen K , Setälä O , Radfar B, Kroth U, Vähänissi V , Savin H. (oral talk) Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage. 2022. Abstraktin lähde: Record-high UV response in implanted junctions through passivation of surface defects and minimisation of boron implantation damage, Mondsee, Itävalta.