(oral talk) Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon

Guillaume von Gastrow; Ramon Alcubilla; Pablo Ortega; Marko Yli-Koski; Sònia Conesa-Boj; Anna Fontcuberta i Morral; Hele Savin

(oral talk) Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon

Guillaume von Gastrow
, Ramon Alcubilla
, Pablo Ortega
, Marko Yli-Koski
, Sònia Conesa-Boj
, Anna Fontcuberta i Morral
, Hele Savin

Electron Physics Group (EPG)

Polytechnic University of Catalonia
Swiss Federal Institute of Technology Lausanne

Tutkimustuotos: Artikkeli kirjassa/konferenssijulkaisussa › Abstract › Scientific › vertaisarvioitu

Alkuperäiskieli	Englanti
Tila	Julkaistu - 2015
OKM-julkaisutyyppi	Ei sovellu
Tapahtuma	International Conference on Crystalline Silicon Photovoltaics - Konstanz, Saksa Kesto: 23 maalisk. 2015 → 25 maalisk. 2015 Konferenssinumero: 5

Conference

Conference	International Conference on Crystalline Silicon Photovoltaics
Lyhennettä	SiliconPV
Maa/Alue	Saksa
Kaupunki	Konstanz
Ajanjakso	23/03/2015 → 25/03/2015

Tutkimusalat

Al2O3
atomic layer deposition
nano-texturing
negative charge
reactive ion etching
surface passivation

Siteeraa tätä

@conference{84ece964ac494cd18a9c8812e5d0f041,

title = "(oral talk) Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon",

keywords = "Al2O3, atomic layer deposition, nano-texturing, negative charge, reactive ion etching, surface passivation, Al2O3, atomic layer deposition, nano-texturing, negative charge, reactive ion etching, surface passivation, Al2O3, atomic layer deposition, nano-texturing, negative charge, reactive ion etching, surface passivation",

author = "\{von Gastrow\}, Guillaume and Ramon Alcubilla and Pablo Ortega and Marko Yli-Koski and S{\`o}nia Conesa-Boj and \{Fontcuberta i Morral\}, Anna and Hele Savin",

year = "2015",

language = "English",

note = "International Conference on Crystalline Silicon Photovoltaics, SiliconPV ; Conference date: 23-03-2015 Through 25-03-2015",

}

(oral talk) Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon. / von Gastrow, Guillaume; Alcubilla, Ramon; Ortega, Pablo et al.
2015. Abstraktin lähde: International Conference on Crystalline Silicon Photovoltaics, Konstanz, Saksa.

Tutkimustuotos: Artikkeli kirjassa/konferenssijulkaisussa › Abstract › Scientific › vertaisarvioitu

TY - CONF

T1 - (oral talk) Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon

AU - von Gastrow, Guillaume

AU - Alcubilla, Ramon

AU - Ortega, Pablo

AU - Yli-Koski, Marko

AU - Conesa-Boj, Sònia

AU - Fontcuberta i Morral, Anna

AU - Savin, Hele

N1 - Conference code: 5

PY - 2015

Y1 - 2015

KW - Al2O3

KW - atomic layer deposition

KW - nano-texturing

KW - negative charge

KW - reactive ion etching

KW - surface passivation

KW - Al2O3

KW - atomic layer deposition

KW - nano-texturing

KW - negative charge

KW - reactive ion etching

KW - surface passivation

KW - Al2O3

KW - atomic layer deposition

KW - nano-texturing

KW - negative charge

KW - reactive ion etching

KW - surface passivation

M3 - Abstract

T2 - International Conference on Crystalline Silicon Photovoltaics

Y2 - 23 March 2015 through 25 March 2015

ER -