Optimizing measurement accuracy in microscope-based reflectometry for thin film optical properties

Masoud Rastgou; Aleksandr Danilenko; Juha Peltoniemi; Farshid Manoocheri; Erkki Ikonen

doi:10.1088/1361-6501/ade329

Optimizing measurement accuracy in microscope-based reflectometry for thin film optical properties

Masoud Rastgou^*, Aleksandr Danilenko, Juha Peltoniemi, Farshid Manoocheri, Erkki Ikonen

^*Tämän työn vastaava kirjoittaja

VTT Technical Research Centre of Finland Ltd.

Tutkimustuotos: Lehtiartikkeli › Article › Scientific › vertaisarvioitu

1 Sitaatiot (Scopus)

19 Lataukset (Pure)

Abstrakti

Accurate characterization of thin film optical properties is important for the electronics and photonics industries. This paper focuses on optimizing measurement accuracy for microscope-based reflectometers with an on-axis incident beam. Key factors analyzed include the distribution of angles of incidence in microscope geometry, spectrometer bandwidth correction, and sample thickness variations. We develop a reflectance model incorporating these factors, improving fit quality essential for reliable uncertainty analysis. Validation measurements with SiO₂ on Si layers (10-2000 nm) using a working standard gonio-reflectometer show consistent thickness values with the microscope-based reflectometer, confirming the reliability of the approach.

Alkuperäiskieli	Englanti
Artikkeli	075001
Sivut	1-11
Sivumäärä	11
Julkaisu	Measurement Science and Technology
Vuosikerta	36
Numero	7
DOI - pysyväislinkit	https://doi.org/10.1088/1361-6501/ade329
Tila	Julkaistu - 31 heinäk. 2025
OKM-julkaisutyyppi	A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Rahoitus

The Project 20IND04 ATMOC leading to this publication has received funding from the EURAMET EMPIR program co-financed by the participating states and the European Union’s Horizon 2020 research and innovation program. The work is part of the Research Council of Finland Flagship Programme, Photonics Research and Innovation (PREIN), Decision Number 346529, Aalto University.

Pääsy asiakirjaan

10.1088/1361-6501/ade329Lisenssi: CC BY

Understanding_electrochemical_reactions_using_density_functional_theoryFinal published version, 2,22 MBLisenssi: CC BY

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Linkki julkaisuun Scopuksessa

PREIN 2: Photonics Research and Innovation
Naukkarinen, O. (Vastuullinen johtaja), Ding, E. (Projektin jäsen), Liu, X. (Projektin jäsen), Vähänissi, V. (Projektin jäsen), Li, D. (Projektin jäsen), Ahmed, F. (Projektin jäsen), Sehrawat, S. (Projektin jäsen), Shafi, A. (Projektin jäsen), Zang, X. (Projektin jäsen), Radfar, B. (Projektin jäsen), Yli-Koski, M. (Projektin jäsen) & Mehmood, N. (Projektin jäsen)
01/09/2022 → 31/12/2026
Projekti: RCF Flagship

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title = "Optimizing measurement accuracy in microscope-based reflectometry for thin film optical properties",

abstract = "Accurate characterization of thin film optical properties is important for the electronics and photonics industries. This paper focuses on optimizing measurement accuracy for microscope-based reflectometers with an on-axis incident beam. Key factors analyzed include the distribution of angles of incidence in microscope geometry, spectrometer bandwidth correction, and sample thickness variations. We develop a reflectance model incorporating these factors, improving fit quality essential for reliable uncertainty analysis. Validation measurements with SiO2 on Si layers (10-2000 nm) using a working standard gonio-reflectometer show consistent thickness values with the microscope-based reflectometer, confirming the reliability of the approach.",

keywords = "angle of incidence, bandwidth, micro-reflectometer, thin film thickness",

author = "Masoud Rastgou and Aleksandr Danilenko and Juha Peltoniemi and Farshid Manoocheri and Erkki Ikonen",

note = "Publisher Copyright: {\textcopyright} 2025 The Author(s). Published by IOP Publishing Ltd.",

year = "2025",

month = jul,

day = "31",

doi = "10.1088/1361-6501/ade329",

language = "English",

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T1 - Optimizing measurement accuracy in microscope-based reflectometry for thin film optical properties

AU - Rastgou, Masoud

AU - Danilenko, Aleksandr

AU - Peltoniemi, Juha

AU - Manoocheri, Farshid

AU - Ikonen, Erkki

PY - 2025/7/31

Y1 - 2025/7/31

N2 - Accurate characterization of thin film optical properties is important for the electronics and photonics industries. This paper focuses on optimizing measurement accuracy for microscope-based reflectometers with an on-axis incident beam. Key factors analyzed include the distribution of angles of incidence in microscope geometry, spectrometer bandwidth correction, and sample thickness variations. We develop a reflectance model incorporating these factors, improving fit quality essential for reliable uncertainty analysis. Validation measurements with SiO2 on Si layers (10-2000 nm) using a working standard gonio-reflectometer show consistent thickness values with the microscope-based reflectometer, confirming the reliability of the approach.

AB - Accurate characterization of thin film optical properties is important for the electronics and photonics industries. This paper focuses on optimizing measurement accuracy for microscope-based reflectometers with an on-axis incident beam. Key factors analyzed include the distribution of angles of incidence in microscope geometry, spectrometer bandwidth correction, and sample thickness variations. We develop a reflectance model incorporating these factors, improving fit quality essential for reliable uncertainty analysis. Validation measurements with SiO2 on Si layers (10-2000 nm) using a working standard gonio-reflectometer show consistent thickness values with the microscope-based reflectometer, confirming the reliability of the approach.

KW - angle of incidence

KW - bandwidth

KW - micro-reflectometer

KW - thin film thickness

UR - https://www.scopus.com/pages/publications/105008996331

U2 - 10.1088/1361-6501/ade329

DO - 10.1088/1361-6501/ade329

M3 - Article

AN - SCOPUS:105008996331

SN - 0957-0233

VL - 36

SP - 1

EP - 11

JO - Measurement Science and Technology

JF - Measurement Science and Technology

IS - 7

M1 - 075001

ER -

Optimizing measurement accuracy in microscope-based reflectometry for thin film optical properties

Abstrakti

Rahoitus

Pääsy asiakirjaan

Muut tiedostot ja linkit

Sormenjälki

Projektit

PREIN 2: Photonics Research and Innovation

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