Neural analysis of integrated circuit yield dependence on CMOS process control parameters

Mika Karilahti

Neural analysis of integrated circuit yield dependence on CMOS process control parameters

Mika Karilahti

Tutkimustuotos: Lehtiartikkeli › Article › Scientific › vertaisarvioitu

1 Sitaatiot (Scopus)

Alkuperäiskieli	Englanti
Sivut	00-00
Julkaisu	Microelectronics Reliability
Numero	00
Tila	Julkaistu - 2002
OKM-julkaisutyyppi	A1 Julkaistu artikkeli, soviteltu

Tutkimusalat

semiconductors
synchrotron X-ray topography

Siteeraa tätä

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title = "Neural analysis of integrated circuit yield dependence on CMOS process control parameters",

keywords = "semiconductors, synchrotron X-ray topography, semiconductors, synchrotron X-ray topography, semiconductors, synchrotron X-ray topography",

author = "Mika Karilahti",

year = "2002",

language = "English",

pages = "00--00",

journal = "Microelectronics Reliability",

issn = "0026-2714",

number = "00",

}

TY - JOUR

T1 - Neural analysis of integrated circuit yield dependence on CMOS process control parameters

AU - Karilahti, Mika

PY - 2002

Y1 - 2002

KW - semiconductors

KW - synchrotron X-ray topography

KW - semiconductors

KW - synchrotron X-ray topography

KW - semiconductors

KW - synchrotron X-ray topography

M3 - Article

SP - 0

EP - 0

JO - Microelectronics Reliability

JF - Microelectronics Reliability

SN - 0026-2714

IS - 00

ER -