Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate

Tutkimustuotos: Lehtiartikkeli

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Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate. / Lyytinen, Jussi; Liu, Xuwen; Ylivaara, Oili M. E.; Sintonen, Sakari; Iyer, Ajai; Ali, Saima; Julin, Jaakko; Lipsanen, Harri; Sajavaara, Timo; Puurunen, Riikka L.; Koskinen, Jari.

julkaisussa: Wear, Vuosikerta 342-343, 15.11.2015, s. 270-278.

Tutkimustuotos: Lehtiartikkeli

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Lyytinen, Jussi ; Liu, Xuwen ; Ylivaara, Oili M. E. ; Sintonen, Sakari ; Iyer, Ajai ; Ali, Saima ; Julin, Jaakko ; Lipsanen, Harri ; Sajavaara, Timo ; Puurunen, Riikka L. ; Koskinen, Jari. / Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate. Julkaisussa: Wear. 2015 ; Vuosikerta 342-343. Sivut 270-278.

Bibtex - Lataa

@article{ef8fbfb2463441e0b712897349686cf1,
title = "Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate",
abstract = "For every coating it is critical that the coatings are sufficiently durable to withstand practical applications and that the films adhere well enough to the substrate. In this paper the nanotribological, nanomechanical and interfacial properties of 15-100nm thick atomic layer deposited (ALD) TiO2 coatings deposited at 110-300°C were studied using a novel combination of nanoscratch and scanning nanowear testing. Thin film wear increased linearly with increasing scanning nanowear load. The film deposited at 300°C was up to 58±11 {\%}-points more wear-resistant compared to the films deposited at lower temperatures due to higher hardness and crystallinity of the film. Amorphous/nanocrystalline composite structure with agglomerated crystallites was observed with TiO2 deposited at 200°C and the agglomerates were up to 37±10{\%}-points more wear-resistant than the amorphous/nanocrystalline matrix. All of the tested films had excellent interfacial properties and no delamination was observed with the films outside of the scanned regions. These findings may prove useful in the development of tribological and mechanical characterization methods, and in developing thin film materials with enhanced properties tailored to their function. This will also help in the development and tuning of ALD processes.",
keywords = "Atomic layer deposition, Interfacial characterization, Nanomechanical characterization, Nanoscratch, Nanotribology, Scanning nanowear",
author = "Jussi Lyytinen and Xuwen Liu and Ylivaara, {Oili M. E.} and Sakari Sintonen and Ajai Iyer and Saima Ali and Jaakko Julin and Harri Lipsanen and Timo Sajavaara and Puurunen, {Riikka L.} and Jari Koskinen",
year = "2015",
month = "11",
day = "15",
doi = "10.1016/j.wear.2015.09.001",
language = "English",
volume = "342-343",
pages = "270--278",
journal = "Wear",
issn = "0043-1648",
publisher = "Elsevier BV",

}

RIS - Lataa

TY - JOUR

T1 - Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate

AU - Lyytinen, Jussi

AU - Liu, Xuwen

AU - Ylivaara, Oili M. E.

AU - Sintonen, Sakari

AU - Iyer, Ajai

AU - Ali, Saima

AU - Julin, Jaakko

AU - Lipsanen, Harri

AU - Sajavaara, Timo

AU - Puurunen, Riikka L.

AU - Koskinen, Jari

PY - 2015/11/15

Y1 - 2015/11/15

N2 - For every coating it is critical that the coatings are sufficiently durable to withstand practical applications and that the films adhere well enough to the substrate. In this paper the nanotribological, nanomechanical and interfacial properties of 15-100nm thick atomic layer deposited (ALD) TiO2 coatings deposited at 110-300°C were studied using a novel combination of nanoscratch and scanning nanowear testing. Thin film wear increased linearly with increasing scanning nanowear load. The film deposited at 300°C was up to 58±11 %-points more wear-resistant compared to the films deposited at lower temperatures due to higher hardness and crystallinity of the film. Amorphous/nanocrystalline composite structure with agglomerated crystallites was observed with TiO2 deposited at 200°C and the agglomerates were up to 37±10%-points more wear-resistant than the amorphous/nanocrystalline matrix. All of the tested films had excellent interfacial properties and no delamination was observed with the films outside of the scanned regions. These findings may prove useful in the development of tribological and mechanical characterization methods, and in developing thin film materials with enhanced properties tailored to their function. This will also help in the development and tuning of ALD processes.

AB - For every coating it is critical that the coatings are sufficiently durable to withstand practical applications and that the films adhere well enough to the substrate. In this paper the nanotribological, nanomechanical and interfacial properties of 15-100nm thick atomic layer deposited (ALD) TiO2 coatings deposited at 110-300°C were studied using a novel combination of nanoscratch and scanning nanowear testing. Thin film wear increased linearly with increasing scanning nanowear load. The film deposited at 300°C was up to 58±11 %-points more wear-resistant compared to the films deposited at lower temperatures due to higher hardness and crystallinity of the film. Amorphous/nanocrystalline composite structure with agglomerated crystallites was observed with TiO2 deposited at 200°C and the agglomerates were up to 37±10%-points more wear-resistant than the amorphous/nanocrystalline matrix. All of the tested films had excellent interfacial properties and no delamination was observed with the films outside of the scanned regions. These findings may prove useful in the development of tribological and mechanical characterization methods, and in developing thin film materials with enhanced properties tailored to their function. This will also help in the development and tuning of ALD processes.

KW - Atomic layer deposition

KW - Interfacial characterization

KW - Nanomechanical characterization

KW - Nanoscratch

KW - Nanotribology

KW - Scanning nanowear

UR - http://www.scopus.com/inward/record.url?scp=84942543865&partnerID=8YFLogxK

U2 - 10.1016/j.wear.2015.09.001

DO - 10.1016/j.wear.2015.09.001

M3 - Article

VL - 342-343

SP - 270

EP - 278

JO - Wear

JF - Wear

SN - 0043-1648

ER -

ID: 1473492