Nanoscale patterning of silicon with focused ion beam and anisotropic wer etching

Päivi Sievilä, Nikolai Chekurov, Ilkka Tittonen

Tutkimustuotos: Artikkeli kirjassa/konferenssijulkaisussa › Conference article in proceedings › Scientific › vertaisarvioitu

Alkuperäiskieli	Englanti
Otsikko	Physics Days, Jyväskylä, 11-13 March, Finland
Julkaisupaikka	Jyväskylä
Kustantaja	Finnish Physical Society
Tila	Julkaistu - 2010
OKM-julkaisutyyppi	A4 Artikkeli konferenssijulkaisussa

Nimi
Kustantaja	The Finnish Physical Society
ISSN (painettu)	0075-465X

Tutkimusalat

@inproceedings{46f976fb1054466f89e9851ea4fab991,

title = "Nanoscale patterning of silicon with focused ion beam and anisotropic wer etching",

keywords = "focused ion beam, TMAH, focused ion beam, TMAH, focused ion beam, TMAH",

author = "P{\"a}ivi Sievil{\"a} and Nikolai Chekurov and Ilkka Tittonen",

year = "2010",

language = "English",

publisher = "Finnish Physical Society",

booktitle = "Physics Days, Jyv{\"a}skyl{\"a}, 11-13 March, Finland",

address = "Finland",

}

TY - GEN

T1 - Nanoscale patterning of silicon with focused ion beam and anisotropic wer etching

AU - Sievilä, Päivi

AU - Chekurov, Nikolai

AU - Tittonen, Ilkka

PY - 2010

Y1 - 2010

KW - focused ion beam

KW - TMAH

KW - focused ion beam

KW - TMAH

KW - focused ion beam

KW - TMAH

M3 - Conference article in proceedings

BT - Physics Days, Jyväskylä, 11-13 March, Finland

PB - Finnish Physical Society

CY - Jyväskylä

ER -