Nanoperforated silicon membranes fabricated by UV-nanoimprint lithography, deep reactive ion etching and atomic layer deposition

Lauri Sainiemi; Jukka Viheriälä; Tiina Sikanen; Janne Laukkanen; Tapio Niemi

doi:10.1088/0960-1317/20/7/077001

Nanoperforated silicon membranes fabricated by UV-nanoimprint lithography, deep reactive ion etching and atomic layer deposition

Lauri Sainiemi
, Jukka Viheriälä
, Tiina Sikanen
, Janne Laukkanen
, Tapio Niemi

Kemian ja materiaalitieteen laitos

Tutkimustuotos: Lehtiartikkeli › Article › Scientific › vertaisarvioitu

19 Sitaatiot (Scopus)

Alkuperäiskieli	Englanti
Sivut	077001
Julkaisu	Journal of Micromechanics and Microengineering
Vuosikerta	20
Numero	7
DOI - pysyväislinkit	https://doi.org/10.1088/0960-1317/20/7/077001
Tila	Julkaistu - 2010
OKM-julkaisutyyppi	A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Tutkimusalat

chemical physics
electronics and devices
interfaces and thin films
physical chemistry
plasma physics
surfaces

Pääsy asiakirjaan

10.1088/0960-1317/20/7/077001

Muut tiedostot ja linkit

http://iopscience.iop.org/0960-1317/20/7/077001/

Raaka-aineiden tutkimusinfrastruktuuri
Karppinen, M. (Manager)
Kemian tekniikan korkeakoulu
Laitteistot/tilat: Facility

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@article{75a8f68d5b8140ba8b8f7573dc9ab35d,

title = "Nanoperforated silicon membranes fabricated by UV-nanoimprint lithography, deep reactive ion etching and atomic layer deposition",

keywords = "chemical physics, electronics and devices, interfaces and thin films, physical chemistry, plasma physics, surfaces, chemical physics, electronics and devices, interfaces and thin films, physical chemistry, plasma physics, surfaces, chemical physics, electronics and devices, interfaces and thin films, physical chemistry, plasma physics, surfaces",

author = "Lauri Sainiemi and Jukka Viheri{\"a}l{\"a} and Tiina Sikanen and Janne Laukkanen and Tapio Niemi",

year = "2010",

doi = "10.1088/0960-1317/20/7/077001",

language = "English",

volume = "20",

pages = "077001",

journal = "Journal of Micromechanics and Microengineering",

issn = "0960-1317",

publisher = "Institute of Physics Publishing",

number = "7",

}

TY - JOUR

T1 - Nanoperforated silicon membranes fabricated by UV-nanoimprint lithography, deep reactive ion etching and atomic layer deposition

AU - Sainiemi, Lauri

AU - Viheriälä, Jukka

AU - Sikanen, Tiina

AU - Laukkanen, Janne

AU - Niemi, Tapio

PY - 2010

Y1 - 2010

KW - chemical physics

KW - electronics and devices

KW - interfaces and thin films

KW - physical chemistry

KW - plasma physics

KW - surfaces

KW - chemical physics

KW - electronics and devices

KW - interfaces and thin films

KW - physical chemistry

KW - plasma physics

KW - surfaces

KW - chemical physics

KW - electronics and devices

KW - interfaces and thin films

KW - physical chemistry

KW - plasma physics

KW - surfaces

UR - http://iopscience.iop.org/0960-1317/20/7/077001/

U2 - 10.1088/0960-1317/20/7/077001

DO - 10.1088/0960-1317/20/7/077001

M3 - Article

SN - 0960-1317

VL - 20

SP - 077001

JO - Journal of Micromechanics and Microengineering

JF - Journal of Micromechanics and Microengineering

IS - 7

ER -

Nanoperforated silicon membranes fabricated by UV-nanoimprint lithography, deep reactive ion etching and atomic layer deposition

Tutkimusalat

Pääsy asiakirjaan

Muut tiedostot ja linkit

Laitteet

Raaka-aineiden tutkimusinfrastruktuuri

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