Low-pressure thermogravimetric analysis for finding sublimation temperatures for organic precursors in atomic/molecular layer deposition

Jenna Multia, Aida Khayyami, Juho Heiska, Maarit Karppinen*

*Tämän työn vastaava kirjoittaja

Tutkimustuotos: LehtiartikkeliArticleScientificvertaisarvioitu

Abstrakti

Atomic/molecular layer deposition (ALD/MLD) is strongly emerging as the state-of-the-art gas-phase fabrication technique for novel functional inorganic-organic thin-film materials. In the actual ALD/MLD process development, selecting the proper sublimation temperatures for the inorganic and organic precursors is an important task. In particular, the latter ones tend to require higher sublimation temperatures. In this work, we systematically investigate a representative set of most common ALD/MLD organic precursors using low-pressure (4 mbar) thermogravimetric (TG) analysis. The onset temperature (TG(onset)) where the weight loss starts is found to well foretell us the optimal precursor source temperature (T-MLD) for ALD/MLD; typically, the T(MLD)value used in a practical ALD/MLD experiment is lower by approximately 14% than the TG(onset)value. Moreover, we discuss the possibility to utilize the melting point of the compound as a starting point if such vacuum TG measurements are not available.

AlkuperäiskieliEnglanti
Artikkeli052406
Sivumäärä10
JulkaisuJOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A
Vuosikerta38
Numero5
DOI - pysyväislinkit
TilaJulkaistu - syyskuuta 2020
OKM-julkaisutyyppiA1 Julkaistu artikkeli, soviteltu

Projektit

  • 1 Päättynyt

Uusia hybridimateriaaleja ALD/MLD:n avulla: perusteista sovelluksiin

Aleksandrova, I., Medina, E., Thomas, C., Karppinen, M., Haggren, A., Tiittanen, T., Multia, J., Ghazy, A., Mustonen, O., Khayyami, A., Revitzer, H., Sederholm, L., Johansson, L. & Madadi, M.

01/09/201624/09/2020

Projekti: Academy of Finland: Other research funding

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