Localized gallium doping and cryogenic deep reactive ion etching in fabrication of silicon nanostructures

Nikolai Chekurov; Kestutis Grigoras; Antti Peltonen; Sami Franssila; Ilkka Tittonen

doi:10.1557/PROC-1181-DD07-01

Localized gallium doping and cryogenic deep reactive ion etching in fabrication of silicon nanostructures

Nikolai Chekurov, Kestutis Grigoras, Antti Peltonen, Sami Franssila, Ilkka Tittonen

Elektroniikan ja nanotekniikan laitos

Tutkimustuotos: Artikkeli kirjassa/konferenssijulkaisussa › Conference article in proceedings › Scientific › vertaisarvioitu

Alkuperäiskieli	Englanti
Otsikko	MRS Spring Meeting 2009, April, San Francisco, USA
Sivut	21-26
DOI - pysyväislinkit	https://doi.org/10.1557/PROC-1181-DD07-01
Tila	Julkaistu - 2009
OKM-julkaisutyyppi	A4 Artikkeli konferenssijulkaisussa

Julkaisusarja

Nimi	Materials Research Society Symposium Proceedings
Vuosikerta	1181
ISSN (painettu)	0272-9172

Tutkimusalat

deep reactive ion etching
focuse ion beam
nanofabrication

Pääsy asiakirjaan

10.1557/PROC-1181-DD07-01

Siteeraa tätä

Chekurov, N., Grigoras, K., Peltonen, A., Franssila, S., & Tittonen, I. (2009). Localized gallium doping and cryogenic deep reactive ion etching in fabrication of silicon nanostructures. teoksessa MRS Spring Meeting 2009, April, San Francisco, USA (Sivut 21-26). (Materials Research Society Symposium Proceedings; Vuosikerta 1181). https://doi.org/10.1557/PROC-1181-DD07-01

@inproceedings{9736db8ed98f4618bc9b081717d0fd96,

title = "Localized gallium doping and cryogenic deep reactive ion etching in fabrication of silicon nanostructures",

keywords = "deep reactive ion etching, focuse ion beam, nanofabrication, deep reactive ion etching, focuse ion beam, nanofabrication, deep reactive ion etching, focuse ion beam, nanofabrication",

author = "Nikolai Chekurov and Kestutis Grigoras and Antti Peltonen and Sami Franssila and Ilkka Tittonen",

year = "2009",

doi = "10.1557/PROC-1181-DD07-01",

language = "English",

isbn = "978-1-60511-154-4",

series = "Materials Research Society Symposium Proceedings",

pages = "21--26",

booktitle = "MRS Spring Meeting 2009, April, San Francisco, USA",

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Localized gallium doping and cryogenic deep reactive ion etching in fabrication of silicon nanostructures. / Chekurov, Nikolai; Grigoras, Kestutis; Peltonen, Antti et al.
MRS Spring Meeting 2009, April, San Francisco, USA. 2009. s. 21-26 (Materials Research Society Symposium Proceedings; Vuosikerta 1181).

Tutkimustuotos: Artikkeli kirjassa/konferenssijulkaisussa › Conference article in proceedings › Scientific › vertaisarvioitu

TY - GEN

T1 - Localized gallium doping and cryogenic deep reactive ion etching in fabrication of silicon nanostructures

AU - Chekurov, Nikolai

AU - Grigoras, Kestutis

AU - Peltonen, Antti

AU - Franssila, Sami

AU - Tittonen, Ilkka

PY - 2009

Y1 - 2009

KW - deep reactive ion etching

KW - focuse ion beam

KW - nanofabrication

KW - deep reactive ion etching

KW - focuse ion beam

KW - nanofabrication

KW - deep reactive ion etching

KW - focuse ion beam

KW - nanofabrication

U2 - 10.1557/PROC-1181-DD07-01

DO - 10.1557/PROC-1181-DD07-01

M3 - Conference article in proceedings

SN - 978-1-60511-154-4

T3 - Materials Research Society Symposium Proceedings

SP - 21

EP - 26

BT - MRS Spring Meeting 2009, April, San Francisco, USA

ER -