Learnings from an open science effort: Virtual project on the history of ALD

R. L. Puurunen*

*Tämän työn vastaava kirjoittaja

Tutkimustuotos: Artikkeli kirjassa/konferenssijulkaisussaConference contributionScientificvertaisarvioitu

1 Sitaatiot (Scopus)

Abstrakti

This work summarizes learnings from an Open Science effort "Virtual project on the History of ALD" (VPHA), started in 2013 to clarify the early history of atomic layer deposition (ALD). ALD is a multi-tool of nanotechnology and has been e.g. enabler of the continuation of Moore's law of transistor scaling. ALD has been developed historically through two independent routes: atomic layer epitaxy (ALE) and molecular layering (ML). Especially the details on ML have remained little known to a broader audience. In this contribution, learnings in VPHA are seen from the viewpoint of its voluntary coordinator (the author self) related to historical details of ALD as well as from an organizational viewpoint and some other viewpoints. Selected details related to ALD's history not fully accurately described in three earlier review articles are pointed out. The work made in VPHA has resulted in journal articles, presentations and an exhibition, and VPHA has in part provided the foundation for granting the 2018 Millennium Technology Prize to Dr. Tuomo Suntola. At the time of writing this contribution, in July 2018, VPHA is still on-going, and more volunteers are welcome to join the effort.

AlkuperäiskieliEnglanti
OtsikkoATOMIC LAYER DEPOSITION APPLICATIONS
ToimittajatStefan De Gendt, Jeffrey W. Elam, Jolien Dendooven, Oscar Van Der Straten, Fred Roozeboom, Chanyuan Liu, Andrea Illiberi
KustantajaElectrochemical Society, Inc.
Sivut3-17
Sivumäärä15
Vuosikerta14
ISBN (elektroninen)978-1-60768-852-5
DOI - pysyväislinkit
TilaJulkaistu - 1 tammikuuta 2018
OKM-julkaisutyyppiA4 Artikkeli konferenssijulkaisuussa
TapahtumaSymposium on Atomic Layer Deposition Applications - Cancun, Meksiko
Kesto: 30 syyskuuta 20184 lokakuuta 2018
Konferenssinumero: 14

Julkaisusarja

NimiECS Transactions
KustantajaElectrochemical Society, Inc.
Numero6
Vuosikerta86
ISSN (painettu)1938-5862
ISSN (elektroninen)1938-6737

Conference

ConferenceSymposium on Atomic Layer Deposition Applications
MaaMeksiko
KaupunkiCancun
Ajanjakso30/09/201804/10/2018
MuuAiMES, ECS and SMEQ Joint International Meeting

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