Iron-Terephthalate Coordination Network Thin Films Through In-Situ Atomic/Molecular Layer Deposition

Tutkimustuotos: Lehtiartikkeli

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Iron terephthalate coordination network thin films can be fabricated using the state-of-the-art gas-phase atomic/molecular layer deposition (ALD/MLD) technique in a highly controlled manner. Iron is an Earth-abundant and nonhazardous transition metal, and with its rich variety of potential applications an interesting metal constituent for the inorganic-organic coordination network films. Our work underlines the role of the metal precursor used when aiming at in-situ ALD/MLD growth of crystalline inorganic-organic thin films. We obtain crystalline iron terephthalate films when FeCl3 is employed as the iron source whereas depositions based on the bulkier Fe(acac)3 precursor yield amorphous films. The chemical composition and structure of the films are investigated with GIXRD, XRR, FTIR and XPS.

Yksityiskohdat

AlkuperäiskieliEnglanti
Artikkeli8976
JulkaisuScientific Reports
Vuosikerta8
Numero1
TilaJulkaistu - 1 joulukuuta 2018
OKM-julkaisutyyppiA1 Julkaistu artikkeli, soviteltu

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