@article{93fc1f97f69d4ccabf145a086e4882ff,
title = "Growth Per Cycle in Atomic Layer Deposition: Real Application Examples of a Theoretical Model",
keywords = "aluminum compounds, atomic layer deposition, growth mechanisms, modeling, titanium, yttrium oxide, aluminum compounds, atomic layer deposition, growth mechanisms, modeling, titanium, yttrium oxide, aluminum compounds, atomic layer deposition, growth mechanisms, modeling, titanium, yttrium oxide",
author = "Riikka Puurunen",
year = "2003",
language = "English",
volume = "9",
pages = "327--332",
journal = "Chemical Vapor Deposition",
issn = "1521-3862",
publisher = "Wiley-VCH Verlag",
number = "6",
}