Electrochemical reduction of carbon dioxide to formate in a flow cell on CuSx grown by atomic layer deposition

M. Suominen*, M. Mäntymäki, M. Mattinen, J. Sainio, M. Putkonen, T. Kallio*

*Tämän työn vastaava kirjoittaja

Tutkimustuotos: LehtiartikkeliArticleScientificvertaisarvioitu

6 Sitaatiot (Scopus)
49 Lataukset (Pure)

Abstrakti

Transition metal chalcogenides (TMCs) are promising pre-catalysts for tuning the selectivity of electrochemical carbon dioxide (CO2) reduction (CO2R). Atomic layer deposition (ALD) enables well-controlled growth of thin TMC films on various gas diffusion electrodes. Herein, we have studied the CO2R performance of ALD-grown copper sulfide (CuSx) in a flow cell. The effects of electrode configuration, electrolyte concentration, temperature, and electrolysis time were carefully studied, combined with pre- and post-electrolysis physico-chemical analyses of the films. The unique selectivity of sulfur-doped Cu towards formate was retained with Faradaic efficiencies between 40 and 60%, but slow selectivity changes were observed over time. Major loss of sulfur was encountered during the initial 5-min reduction period, and after that, progressive formation of nanoparticles could be observed. Comparisons to ALD-grown Cu thin film and CuSx-modified Cu foam electrodes verified the importance of sulfur and suggested that other electrocatalyst films could be easily realized with ALD.

AlkuperäiskieliEnglanti
Artikkeli100575
Sivumäärä10
JulkaisuMaterials Today Sustainability
Vuosikerta24
Varhainen verkossa julkaisun päivämäärä2 marrask. 2023
DOI - pysyväislinkit
TilaJulkaistu - jouluk. 2023
OKM-julkaisutyyppiA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

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