Abstrakti
Transition metal chalcogenides (TMCs) are promising pre-catalysts for tuning the selectivity of electrochemical carbon dioxide (CO2) reduction (CO2R). Atomic layer deposition (ALD) enables well-controlled growth of thin TMC films on various gas diffusion electrodes. Herein, we have studied the CO2R performance of ALD-grown copper sulfide (CuSx) in a flow cell. The effects of electrode configuration, electrolyte concentration, temperature, and electrolysis time were carefully studied, combined with pre- and post-electrolysis physico-chemical analyses of the films. The unique selectivity of sulfur-doped Cu towards formate was retained with Faradaic efficiencies between 40 and 60%, but slow selectivity changes were observed over time. Major loss of sulfur was encountered during the initial 5-min reduction period, and after that, progressive formation of nanoparticles could be observed. Comparisons to ALD-grown Cu thin film and CuSx-modified Cu foam electrodes verified the importance of sulfur and suggested that other electrocatalyst films could be easily realized with ALD.
Alkuperäiskieli | Englanti |
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Artikkeli | 100575 |
Sivumäärä | 10 |
Julkaisu | Materials Today Sustainability |
Vuosikerta | 24 |
Varhainen verkossa julkaisun päivämäärä | 2 marrask. 2023 |
DOI - pysyväislinkit | |
Tila | Julkaistu - jouluk. 2023 |
OKM-julkaisutyyppi | A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä |
Sormenjälki
Sukella tutkimusaiheisiin 'Electrochemical reduction of carbon dioxide to formate in a flow cell on CuSx grown by atomic layer deposition'. Ne muodostavat yhdessä ainutlaatuisen sormenjäljen.Laitteet
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Biotalousinfrastruktuuri
Seppälä, J. (Manager)
Kemian tekniikan korkeakouluLaitteistot/tilat: Facility
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OtaNano – Kylmälaboratorio
Savin, A. (Manager) & Rissanen, A. (Other)
OtaNanoLaitteistot/tilat: Facility