Determination of P/Al ratio in phosphorus-doped aluminium oxide thin films by XRF, RBS and FTIR

M. Nieminen; L. Niinistö; R. Lappalainen

Determination of P/Al ratio in phosphorus-doped aluminium oxide thin films by XRF, RBS and FTIR

M. Nieminen, L. Niinistö, R. Lappalainen

Tutkimustuotos: Lehtiartikkeli › Article › Scientific › vertaisarvioitu

37 Sitaatiot (Scopus)

Alkuperäiskieli	Englanti
Sivut	13-22
Julkaisu	Microchimica Acta
Vuosikerta	119
Tila	Julkaistu - 1995
OKM-julkaisutyyppi	A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Tutkimusalat

aluminium oxide
ftir
phosphorus
rbs
thin film
xrf

Siteeraa tätä

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title = "Determination of P/Al ratio in phosphorus-doped aluminium oxide thin films by XRF, RBS and FTIR",

keywords = "aluminium oxide, ftir, phosphorus, rbs, thin film, xrf, aluminium oxide, ftir, phosphorus, rbs, thin film, xrf, aluminium oxide, ftir, phosphorus, rbs, thin film, xrf",

author = "M. Nieminen and L. Niinist{\"o} and R. Lappalainen",

year = "1995",

language = "English",

volume = "119",

pages = "13--22",

journal = "Microchimica Acta",

issn = "1436-5073",

publisher = "Springer",

}

TY - JOUR

T1 - Determination of P/Al ratio in phosphorus-doped aluminium oxide thin films by XRF, RBS and FTIR

AU - Nieminen, M.

AU - Niinistö, L.

AU - Lappalainen, R.

PY - 1995

Y1 - 1995

KW - aluminium oxide

KW - ftir

KW - phosphorus

KW - rbs

KW - thin film

KW - xrf

KW - aluminium oxide

KW - ftir

KW - phosphorus

KW - rbs

KW - thin film

KW - xrf

KW - aluminium oxide

KW - ftir

KW - phosphorus

KW - rbs

KW - thin film

KW - xrf

M3 - Article

SN - 1436-5073

VL - 119

SP - 13

EP - 22

JO - Microchimica Acta

JF - Microchimica Acta

ER -