Crossover between Electron-Phonon and Boundary-Resistance Limits to Thermal Relaxation in Copper Films

Tutkimustuotos: Lehtiartikkeli

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Bibtex - Lataa

@article{22781835b334403ba82cfd3601ef2c6f,
title = "Crossover between Electron-Phonon and Boundary-Resistance Limits to Thermal Relaxation in Copper Films",
abstract = "We observe a crossover fromelectron-phonon (e-ph) coupling limited energy relaxation to that governed by thermal boundary resistance (phonon-phonon coupling, ph-ph) in copper films at subkelvin temperatures. Our measurement yields a quantitative picture of heat currents, in terms of temperature dependences and magnitudes, in both e-ph and pp limited regimes, respectively. We show that by adding a third layer in between the copper film and the substrate, the thermal boundary resistance is increased fourfold, consistent with an assumed series connection of thermal resistances.",
keywords = "HEAT-CONDUCTION, HOT-ELECTRONS, QUANTUM, MULTILAYERS",
author = "Wang, {L. B.} and O-P Saira and Golubev, {D. S.} and Pekola, {J. P.}",
note = "| openaire: EC/H2020/742559/EU//SQH",
year = "2019",
month = "8",
day = "23",
doi = "10.1103/PhysRevApplied.12.024051",
language = "English",
volume = "12",
pages = "1--6",
journal = "Physical Review Applied",
issn = "2331-7019",
publisher = "American Physical Society",
number = "2",

}

RIS - Lataa

TY - JOUR

T1 - Crossover between Electron-Phonon and Boundary-Resistance Limits to Thermal Relaxation in Copper Films

AU - Wang, L. B.

AU - Saira, O-P

AU - Golubev, D. S.

AU - Pekola, J. P.

N1 - | openaire: EC/H2020/742559/EU//SQH

PY - 2019/8/23

Y1 - 2019/8/23

N2 - We observe a crossover fromelectron-phonon (e-ph) coupling limited energy relaxation to that governed by thermal boundary resistance (phonon-phonon coupling, ph-ph) in copper films at subkelvin temperatures. Our measurement yields a quantitative picture of heat currents, in terms of temperature dependences and magnitudes, in both e-ph and pp limited regimes, respectively. We show that by adding a third layer in between the copper film and the substrate, the thermal boundary resistance is increased fourfold, consistent with an assumed series connection of thermal resistances.

AB - We observe a crossover fromelectron-phonon (e-ph) coupling limited energy relaxation to that governed by thermal boundary resistance (phonon-phonon coupling, ph-ph) in copper films at subkelvin temperatures. Our measurement yields a quantitative picture of heat currents, in terms of temperature dependences and magnitudes, in both e-ph and pp limited regimes, respectively. We show that by adding a third layer in between the copper film and the substrate, the thermal boundary resistance is increased fourfold, consistent with an assumed series connection of thermal resistances.

KW - HEAT-CONDUCTION

KW - HOT-ELECTRONS

KW - QUANTUM

KW - MULTILAYERS

U2 - 10.1103/PhysRevApplied.12.024051

DO - 10.1103/PhysRevApplied.12.024051

M3 - Article

VL - 12

SP - 1

EP - 6

JO - Physical Review Applied

JF - Physical Review Applied

SN - 2331-7019

IS - 2

M1 - 024051

ER -

ID: 36792598