Crossover between Electron-Phonon and Boundary-Resistance Limits to Thermal Relaxation in Copper Films

Tutkimustuotos: Lehtiartikkelivertaisarvioitu

Tutkijat

Organisaatiot

  • California Institute of Technology
  • Brookhaven National Laboratory

Kuvaus

We observe a crossover fromelectron-phonon (e-ph) coupling limited energy relaxation to that governed by thermal boundary resistance (phonon-phonon coupling, ph-ph) in copper films at subkelvin temperatures. Our measurement yields a quantitative picture of heat currents, in terms of temperature dependences and magnitudes, in both e-ph and pp limited regimes, respectively. We show that by adding a third layer in between the copper film and the substrate, the thermal boundary resistance is increased fourfold, consistent with an assumed series connection of thermal resistances.

Yksityiskohdat

AlkuperäiskieliEnglanti
Artikkeli024051
Sivut1-6
Sivumäärä6
JulkaisuPhysical Review Applied
Vuosikerta12
Numero2
TilaJulkaistu - 23 elokuuta 2019
OKM-julkaisutyyppiA1 Julkaistu artikkeli, soviteltu

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