@techreport{fb68fa44d449472db652310e4842a991,
title = "Covering of porous silicon pores by atomic layer epitaxy",
keywords = "ale, atomic layer epitaxy, tin oxide, ale, atomic layer epitaxy, tin oxide, ale, atomic layer epitaxy, tin oxide",
author = "M. Utriainen and S. Lehto and M. Nieminen and L. Niinist{\"o} and C. Ducs{\"o} and N.Q. Khan and Z. Horvath and I. Barsony",
year = "1996",
language = "English",
series = "The 9th Symposium on Inorganic and Analytical Chemistry, Helsinki, 24.5.1996",
publisher = "Department of Chemistry, University of Helsinki",
pages = "74",
type = "WorkingPaper",
institution = "Department of Chemistry, University of Helsinki",
}