Chemical vapour deposition of high-Tc superconducting thin films

M. Leskelä, H. Mölsä, L. Niinistö

Tutkimustuotos: Lehtiartikkeli › Article › Scientific › vertaisarvioitu

Alkuperäiskieli	Englanti
Sivut	627-656
Julkaisu	Superconductor Science & Technology
Vuosikerta	6
Tila	Julkaistu - 1993
OKM-julkaisutyyppi	A1 Julkaistu artikkeli, soviteltu

Tutkimusalat

@article{c08f40ef407f4da0b1c078d151dfdad0,

title = "Chemical vapour deposition of high-Tc superconducting thin films",

keywords = "CVD, review, superconductor, thin films, CVD, review, superconductor, thin films, CVD, review, superconductor, thin films",

author = "M. Leskel{\"a} and H. M{\"o}ls{\"a} and L. Niinist{\"o}",

year = "1993",

language = "English",

volume = "6",

pages = "627--656",

journal = "Superconductor Science and Technology",

issn = "0953-2048",

publisher = "IOP Publishing Ltd.",

}

TY - JOUR

T1 - Chemical vapour deposition of high-Tc superconducting thin films

AU - Leskelä, M.

AU - Mölsä, H.

AU - Niinistö, L.

PY - 1993

Y1 - 1993

KW - CVD

KW - review

KW - superconductor

KW - thin films

KW - CVD

KW - review

KW - superconductor

KW - thin films

KW - CVD

KW - review

KW - superconductor

KW - thin films

M3 - Article

VL - 6

SP - 627

EP - 656

JO - Superconductor Science and Technology

JF - Superconductor Science and Technology

SN - 0953-2048

ER -