Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

TY - JOUR

T1 - Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

AU - Niskanen, Antti J.

AU - Varpula, Aapo

AU - Utriainen, Mikko

AU - Natarajan, Gomathi

AU - Cameron, David C

AU - Novikov, Sergey

AU - Airaksinen, Veli-Matti

AU - Sinkkonen, Juha

AU - Franssila, Sami

PY - 2010

Y1 - 2010

KW - atomic layer deposition

KW - metal-oxide gas sensor

KW - microhotplate gas sensor

KW - tin dioxide

KW - atomic layer deposition

KW - metal-oxide gas sensor

KW - microhotplate gas sensor

KW - tin dioxide

KW - atomic layer deposition

KW - metal-oxide gas sensor

KW - microhotplate gas sensor

KW - tin dioxide

UR - http://dx.doi.org/10.1016/j.snb.2010.05.018

U2 - 10.1016/j.snb.2010.05.018

DO - 10.1016/j.snb.2010.05.018

M3 - Article

SN - 0925-4005

VL - 148

SP - 227

EP - 232

JO - Sensors and Actuators B: Chemical

JF - Sensors and Actuators B: Chemical

IS - 1

ER -