@article{29266f5c95b841bc80f3a394973e08a5,
title = "Atomic Layer Deposited Alumina (Al203) Coating on Thin Film Cryoresistors",
keywords = "coatings, dielectric films, resistance measurement, stability, thin-film resistors, coatings, dielectric films, resistance measurement, stability, thin-film resistors, coatings, dielectric films, resistance measurement, stability, thin-film resistors",
author = "P{\"a}ivi Sievil{\"a} and Ossi Hahtela and Alexandre Satrapinski and Nikolai Chekurov",
year = "2009",
language = "English",
volume = "58",
pages = "1183--1187",
journal = "IEEE Transactions on Instrumentation and Measurement",
issn = "1557-9662",
publisher = "IEEE",
number = "4",
}