Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements

Amr Ghazy; David Zanders; Anjana Devi; Maarit Karppinen

doi:10.1002/admi.202400274

Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements

Amr Ghazy
, David Zanders
, Anjana Devi^*
, Maarit Karppinen^*

^*Tämän työn vastaava kirjoittaja

Tutkimustuotos: Lehtiartikkeli › Review Article › vertaisarvioitu

9 Viittaukset (Web of Science)

20 Lataukset (Pure)

Abstrakti

High-quality rare earth element (R) based thin films are in demand for applications ranging from (opto)electronics and energy conversion/storage to medical diagnostics, imaging and security technologies. Atomic layer deposition (ALD) offers large-area homogeneous and conformal ultrathin films and is uniquely suited to address the requirements set by the potential applications of R-based thin films. The history starts from the 1990s, when the first electroluminescent R-doped thin films were grown with ALD. The interest soon expanded to rare earth element oxide layers as high-k gate dielectrics in semiconductor devices, and later to complex ternary and quaternary perovskite oxides with novel functional properties. The most recent advancements related to the combined atomic/molecular layer deposition (ALD/MLD) have rapidly expanded the family of R-organic hybrid materials with intriguing luminescence and up-conversion properties. This review provides up-to-date insights to the current state of ALD and ALD/MLD research of R-based thin films and highlights their application potential.

Alkuperäiskieli	Englanti
Artikkeli	2400274
Sivumäärä	30
Julkaisu	Advanced Materials Interfaces
Vuosikerta	12
Numero	4
Varhainen verkossa julkaisun päivämäärä	23 elok. 2024
DOI - pysyväislinkit	https://doi.org/10.1002/admi.202400274
Tila	Julkaistu - 17 helmik. 2025
OKM-julkaisutyyppi	A2 Katsausartikkeli tieteellisessä aikakauslehdessä

Rahoitus

Funding was received from the European Union (ERC AdG, UniEnMLD, No. 101097815). Views and opinions expressed are however those of the authors only and do not necessarily reflect those of the European Union or the European Research Council. Neither the European Union nor the granting authority can be held responsible for them. A.D. thanks the Leibniz Association, Attract Funding of Fraunhofer and Ruhr University Bochum (RUB) for supporting this work. A. D. and M. K. are grateful to the DAAD and Academy of Finland for funding the ALPMOH project (57610451).

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10.1002/admi.202400274Lisenssi: CC BY

Atomic_and_Molecular_Layer_Deposition_of_Functional_Thin_Films_Based_on_Rare_EarthFinal published version, 2,62 MBLisenssi: CC BY

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1 Päättynyt
1 Aktiivinen

UniEn-MLD: Unique ALD/MLD-Enabled Material Functions
Karppinen, M. (Vastuullinen johtaja), Riikonen, O. (Projektin jäsen), Ishtiaq, S. (Projektin jäsen), Philip, A. (Projektin jäsen), Madadi, M. (Projektin jäsen), Antikainen, E. (Projektin jäsen), Linjala, J. (Projektin jäsen), Sederholm, L. (Projektin jäsen), Jussila, T. (Projektin jäsen), Partanen, O. (Projektin jäsen), Koivisto, I. (Projektin jäsen), Francis, M. (Projektin jäsen), Lone, U. (Projektin jäsen), Larkiala, S. (Projektin jäsen), Pekkanen, J. (Projektin jäsen), Ghazy, A. (Projektin jäsen), Saltarelli, L. (Projektin jäsen), Kousar, S. (Projektin jäsen), Tewari, G. (Projektin jäsen) & Nemesszeghy, M. (Projektin jäsen)
01/06/2023 → 31/05/2028
Projekti: EU Horizon Europe ERC
ALPMOH: Atomic Layer Processing of Metals, Metal Oxide and Hybrid Thin Films for Advanced Applications
Karppinen, M. (Vastuullinen johtaja)
16/02/2022 → 29/02/2024
Projekti: RCF Researcher Mobility

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title = "Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements",

abstract = "High-quality rare earth element (R) based thin films are in demand for applications ranging from (opto)electronics and energy conversion/storage to medical diagnostics, imaging and security technologies. Atomic layer deposition (ALD) offers large-area homogeneous and conformal ultrathin films and is uniquely suited to address the requirements set by the potential applications of R-based thin films. The history starts from the 1990s, when the first electroluminescent R-doped thin films were grown with ALD. The interest soon expanded to rare earth element oxide layers as high-k gate dielectrics in semiconductor devices, and later to complex ternary and quaternary perovskite oxides with novel functional properties. The most recent advancements related to the combined atomic/molecular layer deposition (ALD/MLD) have rapidly expanded the family of R-organic hybrid materials with intriguing luminescence and up-conversion properties. This review provides up-to-date insights to the current state of ALD and ALD/MLD research of R-based thin films and highlights their application potential.",

keywords = "atomic layer deposition, lanthanides, molecular layer deposition, rare earth elements, thin films",

author = "Amr Ghazy and David Zanders and Anjana Devi and Maarit Karppinen",

note = "| openaire: EC/HE/101097815/EU//UniEn-MLD",

year = "2025",

month = feb,

day = "17",

doi = "10.1002/admi.202400274",

language = "English",

volume = "12",

journal = "Advanced Materials Interfaces",

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T1 - Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements

AU - Ghazy, Amr

AU - Zanders, David

AU - Devi, Anjana

AU - Karppinen, Maarit

N1 - | openaire: EC/HE/101097815/EU//UniEn-MLD

PY - 2025/2/17

Y1 - 2025/2/17

N2 - High-quality rare earth element (R) based thin films are in demand for applications ranging from (opto)electronics and energy conversion/storage to medical diagnostics, imaging and security technologies. Atomic layer deposition (ALD) offers large-area homogeneous and conformal ultrathin films and is uniquely suited to address the requirements set by the potential applications of R-based thin films. The history starts from the 1990s, when the first electroluminescent R-doped thin films were grown with ALD. The interest soon expanded to rare earth element oxide layers as high-k gate dielectrics in semiconductor devices, and later to complex ternary and quaternary perovskite oxides with novel functional properties. The most recent advancements related to the combined atomic/molecular layer deposition (ALD/MLD) have rapidly expanded the family of R-organic hybrid materials with intriguing luminescence and up-conversion properties. This review provides up-to-date insights to the current state of ALD and ALD/MLD research of R-based thin films and highlights their application potential.

AB - High-quality rare earth element (R) based thin films are in demand for applications ranging from (opto)electronics and energy conversion/storage to medical diagnostics, imaging and security technologies. Atomic layer deposition (ALD) offers large-area homogeneous and conformal ultrathin films and is uniquely suited to address the requirements set by the potential applications of R-based thin films. The history starts from the 1990s, when the first electroluminescent R-doped thin films were grown with ALD. The interest soon expanded to rare earth element oxide layers as high-k gate dielectrics in semiconductor devices, and later to complex ternary and quaternary perovskite oxides with novel functional properties. The most recent advancements related to the combined atomic/molecular layer deposition (ALD/MLD) have rapidly expanded the family of R-organic hybrid materials with intriguing luminescence and up-conversion properties. This review provides up-to-date insights to the current state of ALD and ALD/MLD research of R-based thin films and highlights their application potential.

KW - atomic layer deposition

KW - lanthanides

KW - molecular layer deposition

KW - rare earth elements

KW - thin films

UR - https://www.scopus.com/pages/publications/85201822464

U2 - 10.1002/admi.202400274

DO - 10.1002/admi.202400274

M3 - Review Article

AN - SCOPUS:85201822464

SN - 2196-7350

VL - 12

JO - Advanced Materials Interfaces

JF - Advanced Materials Interfaces

IS - 4

M1 - 2400274

ER -

Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements

Abstrakti

Rahoitus

Pääsy asiakirjaan

Muut tiedostot ja linkit

Sormenjälki

Projektit

UniEn-MLD: Unique ALD/MLD-Enabled Material Functions

ALPMOH: Atomic Layer Processing of Metals, Metal Oxide and Hybrid Thin Films for Advanced Applications

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