ALD-assisted multi-order dispersion engineering of nanophotonic strip waveguides

Mikhail Erdmanis; Lasse Karvonen; Rizwan Saleem; Mikko Ruoho; Ville Pale; Ari Tervonen; Seppo Honkanen; Ilkka Tittonen

doi:10.1109/JLT.2012.2200235

ALD-assisted multi-order dispersion engineering of nanophotonic strip waveguides

Mikhail Erdmanis
, Lasse Karvonen
, Rizwan Saleem
, Mikko Ruoho
, Ville Pale
, Ari Tervonen
, Seppo Honkanen
, Ilkka Tittonen

Ilkka Tittonen Group

Tutkimustuotos: Lehtiartikkeli › Article › Scientific › vertaisarvioitu

16 Sitaatiot (Scopus)

Abstrakti

We propose a new technique for the multiorder dispersion engineering of nanophotonic strip waveguides. Unlike other techniques, the method does not require wafers with customized parameters and is fully compatible with standard wafers used in nanophotonics. The dispersion management is based on the application of nanometer-thick TiO₂ layer formed by atomic layer deposition. The method is simple and reliable and allows good control of dispersion up to the fourth-order terms. The additional advantages are the reduction of propagation losses and partial compensation of fabrication tolerances.

Alkuperäiskieli	Englanti
Sivut	2488-2493
Julkaisu	Journal of Lightwave Technology
Vuosikerta	30
Numero	15
DOI - pysyväislinkit	https://doi.org/10.1109/JLT.2012.2200235
Tila	Julkaistu - 2012
OKM-julkaisutyyppi	A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Tutkimusalat

Chromatic dispersion, coatings, optical waveguides,
silicon-on-insulator (SOI) technology, thin films

Pääsy asiakirjaan

10.1109/JLT.2012.2200235

Muut tiedostot ja linkit

http://ieeexplore.ieee.org/stamp/stamp.jsp?arnumber=06202662

Siteeraa tätä

@article{a42595c18f9f48fd80030320d7466e5b,

title = "ALD-assisted multi-order dispersion engineering of nanophotonic strip waveguides",

abstract = " We propose a new technique for the multiorder dispersion engineering of nanophotonic strip waveguides. Unlike other techniques, the method does not require wafers with customized parameters and is fully compatible with standard wafers used in nanophotonics. The dispersion management is based on the application of nanometer-thick TiO2 layer formed by atomic layer deposition. The method is simple and reliable and allows good control of dispersion up to the fourth-order terms. The additional advantages are the reduction of propagation losses and partial compensation of fabrication tolerances. ",

keywords = "Chromatic dispersion, coatings, optical waveguides,, silicon-on-insulator (SOI) technology, thin films, Chromatic dispersion, coatings, optical waveguides,, silicon-on-insulator (SOI) technology, thin films, Chromatic dispersion, coatings, optical waveguides,, silicon-on-insulator (SOI) technology, thin films",

author = "Mikhail Erdmanis and Lasse Karvonen and Rizwan Saleem and Mikko Ruoho and Ville Pale and Ari Tervonen and Seppo Honkanen and Ilkka Tittonen",

note = "VK: Academy of Finland projects 129043 and 13251210",

year = "2012",

doi = "10.1109/JLT.2012.2200235",

language = "English",

volume = "30",

pages = "2488--2493",

journal = "Journal of Lightwave Technology",

issn = "0733-8724",

publisher = "IEEE",

number = "15",

}

TY - JOUR

T1 - ALD-assisted multi-order dispersion engineering of nanophotonic strip waveguides

AU - Erdmanis, Mikhail

AU - Karvonen, Lasse

AU - Saleem, Rizwan

AU - Ruoho, Mikko

AU - Pale, Ville

AU - Tervonen, Ari

AU - Honkanen, Seppo

AU - Tittonen, Ilkka

N1 - VK: Academy of Finland projects 129043 and 13251210

PY - 2012

Y1 - 2012

N2 - We propose a new technique for the multiorder dispersion engineering of nanophotonic strip waveguides. Unlike other techniques, the method does not require wafers with customized parameters and is fully compatible with standard wafers used in nanophotonics. The dispersion management is based on the application of nanometer-thick TiO2 layer formed by atomic layer deposition. The method is simple and reliable and allows good control of dispersion up to the fourth-order terms. The additional advantages are the reduction of propagation losses and partial compensation of fabrication tolerances.

AB - We propose a new technique for the multiorder dispersion engineering of nanophotonic strip waveguides. Unlike other techniques, the method does not require wafers with customized parameters and is fully compatible with standard wafers used in nanophotonics. The dispersion management is based on the application of nanometer-thick TiO2 layer formed by atomic layer deposition. The method is simple and reliable and allows good control of dispersion up to the fourth-order terms. The additional advantages are the reduction of propagation losses and partial compensation of fabrication tolerances.

KW - Chromatic dispersion, coatings, optical waveguides,

KW - silicon-on-insulator (SOI) technology, thin films

KW - Chromatic dispersion, coatings, optical waveguides,

KW - silicon-on-insulator (SOI) technology, thin films

KW - Chromatic dispersion, coatings, optical waveguides,

KW - silicon-on-insulator (SOI) technology, thin films

UR - http://ieeexplore.ieee.org/stamp/stamp.jsp?arnumber=06202662

U2 - 10.1109/JLT.2012.2200235

DO - 10.1109/JLT.2012.2200235

M3 - Article

SN - 0733-8724

VL - 30

SP - 2488

EP - 2493

JO - Journal of Lightwave Technology

JF - Journal of Lightwave Technology

IS - 15

ER -

ALD-assisted multi-order dispersion engineering of nanophotonic strip waveguides

Abstrakti

Tutkimusalat

Pääsy asiakirjaan

Muut tiedostot ja linkit

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