Engineering
Atomic Layer
59%
Surface Recombination Velocity
55%
Silicon
50%
Surfaces
37%
Photodiode
33%
Wavelength
32%
Aluminum Oxide
31%
Induced Electric Field
31%
Reflectance
26%
Windows
25%
Surface Passivation
25%
Photons
25%
Thin Films
25%
Silicon Particle
25%
Responsivity
25%
External Quantum Efficiency
22%
Passivation
17%
Front Surface
16%
Pn Junction
14%
Performance
10%
Coating
10%
Applications
9%
Demonstrates
9%
Nanomaterial
9%
Dielectrics
8%
Internal Quantum Efficiency
8%
Thin Films
8%
Electric Field
8%
Alpha Particle
8%
Charge Carrier
8%
Active Region
8%
Fields
7%
Angle of Incidence
7%
Room Temperature
6%
Optical Loss
6%
Electrical Loss
6%
Bias Voltage
6%
Spectral Response
6%
Charge Density
5%
Defect Density
5%
Process Step
5%
Material Science
Germanium
100%
Surface
90%
Surface Passivation
71%
Velocity
55%
Nanocrystalline Material
52%
Al2O3
44%
Aluminum Oxide
41%
Thin Films
25%
Density
14%
Passivation
11%
Optoelectronics
10%
Glass
10%
Sensor
9%
Devices
9%
Nanostructure
6%
Dielectric Material
6%
Oxide Surface
6%
Surface (Surface Science)
6%
Optical Loss
6%
Defect Density
5%
Coating
5%
Chemistry
Germanium
75%
Nanomaterial
52%
Surface
31%
Wavelength
30%
Photon
25%
Sensor
5%
Procedure
5%
Application
5%