Material Science
Adhesion
17%
Adsorption
7%
Al2O3
54%
Aluminum Nitride
11%
Aluminum Oxide
46%
Amorphous Material
18%
Annealing
6%
Characterization
24%
Coating
44%
Density
17%
Devices
9%
Elastic Moduli
9%
Film Deposition
6%
Film Growth
5%
Film Thickness
8%
Friction
8%
Hardness
15%
Impurity
6%
Interface Property
7%
Lithium
6%
Lithium Ion
11%
Material
29%
Mechanical Property
33%
Medical Device
11%
Metal
7%
Microelectromechanical System
12%
Nitride Compound
5%
Optical Property
17%
Reflectivity
12%
Refractive Index
7%
Residual Stress
36%
Silicon
49%
Silicon on Insulator
22%
Spinel
6%
Sputtered Film
6%
Temperature
62%
Thermal Conductivity
11%
Thermomechanical Property
11%
Thin Films
100%
Titanium
11%
Titanium Dioxide
61%
Engineering
Aluminum Oxide
44%
Applications
17%
Atomic Layer
44%
Atomic Layer Deposition
94%
Coating
9%
Conformality
12%
Deposited Film
11%
Deposition Process
17%
Evaluation
11%
Growth Kinetics
11%
High Aspect Ratio
37%
Impedance
6%
Lower Temperature
17%
Measurement
11%
Metal Oxide
7%
Microelectrode Array
11%
Microelectromechanical System
6%
Models
5%
Ray Microanalysis
11%
Silicon
11%
Silicon on Insulator
9%
Simulation
5%
Substrates
18%
Temperature
5%
Test Structure
6%
Testing Method
11%
Thickness
10%
Thin Films
60%
Titanium
11%
Titanium Dioxide
25%
Transmissions
5%
Wafer Bonding
22%
Physics
Aspect Ratio
11%
Atomic Layer Epitaxy
55%
Carbon Dioxide
11%
Carbon Dioxide
5%
Cycles
5%
Diffusion
7%
Encapsulation
11%
Growth
23%
Hydrogen
5%
Impurities
5%
Kinetics
11%
Nitrogen
6%
Optical Properties
5%
Oxide
11%
Oxygen
6%
Residual Stress
11%
Temperature
20%
Thermal Conductivity
11%
Thin Films
34%
Value
6%
