Material Science
Thin Films
100%
Temperature
62%
Titanium Dioxide
61%
Al2O3
54%
Silicon
49%
Aluminum Oxide
46%
Coating
44%
Residual Stress
36%
Mechanical Property
33%
Material
29%
Characterization
24%
Silicon on Insulator
22%
Amorphous Material
18%
Optical Property
17%
Density
17%
Adhesion
17%
Hardness
15%
Reflectivity
12%
Microelectromechanical System
12%
Lithium Ion
11%
Thermal Conductivity
11%
Titanium
11%
Thermomechanical Property
11%
Medical Device
11%
Aluminum Nitride
11%
Elastic Moduli
9%
Devices
9%
Friction
8%
Film Thickness
8%
Interface Property
7%
Metal
7%
Adsorption
7%
Refractive Index
7%
Lithium
6%
Spinel
6%
Annealing
6%
Film Deposition
6%
Impurity
6%
Sputtered Film
6%
Film Growth
5%
Nitride Compound
5%
Engineering
Atomic Layer Deposition
94%
Thin Films
60%
Aluminum Oxide
44%
Atomic Layer
44%
High Aspect Ratio
37%
Titanium Dioxide
25%
Wafer Bonding
22%
Substrates
18%
Deposition Process
17%
Lower Temperature
17%
Applications
17%
Conformality
12%
Measurement
11%
Ray Microanalysis
11%
Growth Kinetics
11%
Titanium
11%
Microelectrode Array
11%
Silicon
11%
Deposited Film
11%
Evaluation
11%
Testing Method
11%
Thickness
10%
Coating
9%
Silicon on Insulator
9%
Metal Oxide
7%
Microelectromechanical System
6%
Impedance
6%
Test Structure
6%
Temperature
5%
Models
5%
Simulation
5%
Transmissions
5%
Physics
Atomic Layer Epitaxy
55%
Thin Films
34%
Growth
23%
Temperature
20%
Aspect Ratio
11%
Kinetics
11%
Oxide
11%
Thermal Conductivity
11%
Residual Stress
11%
Encapsulation
11%
Carbon Dioxide
11%
Diffusion
7%
Oxygen
6%
Nitrogen
6%
Value
6%
Carbon Dioxide
5%
Cycles
5%
Optical Properties
5%
Hydrogen
5%
Impurities
5%
