Thermal Atomic Layer Etching of Aluminum Oxide (Al2O3) Using Sequential Exposures of Niobium Pentafluoride (NbF5) and Carbon Tetrachloride (CCl4): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism

Varun Sharma (Creator)
Simon Elliott (Creator)
Mikko Ritala (Creator)
Tom Blomberg (Creator)
Suvi Haukka (Creator)
Michael E. Givens (Creator)
Marko Tuominen (Creator)

Tietoaineisto

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2021
Thermal Atomic Layer Etching of Aluminum Oxide (Al₂O₃) Using Sequential Exposures of Niobium Pentafluoride (NbF₅) and Carbon Tetrachloride (CCl₄): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism
Sharma, V., Blomberg, T., Haukka, S., Givens, M. E., Tuominen, M., Ritala, M. & Elliott, S., 27 huhtik. 2021, julkaisussa: Chemistry of Materials. 33, 8, s. 2883–2893 11 Sivumäärä
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