Thermal Atomic Layer Etching of Aluminum Oxide (Al2O3) Using Sequential Exposures of Niobium Pentafluoride (NbF5) and Carbon Tetrachloride (CCl4): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism

  • Varun Sharma (Creator)
  • Simon Elliott (Creator)
  • Mikko Ritala (Creator)
  • Tom Blomberg (Creator)
  • Suvi Haukka (Creator)
  • Michael E. Givens (Creator)
  • Marko Tuominen (Creator)

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