ZrO2 Thin Films Grown on Silicon Substrates by Atomic Layer Deposition with Cp2Zr(CH3))2 and Water as Precursors

Matti Putkonen, Jaakko Niinistö, Kaupo Kukli, Timo Sajavaara, Maarit Karppinen, Hisao Yamauchi, Lauri Niinistö

    Research output: Contribution to journalArticleScientificpeer-review

    Original languageEnglish
    Pages (from-to)207-212
    JournalChemical Vapor Deposition
    Volume9
    Issue number4
    Publication statusPublished - 2003
    MoE publication typeA1 Journal article-refereed

    Keywords

    • atomic layer deposition
    • cyclopentadienyl precursor
    • dielectric properties
    • zirconium dioxide

    Cite this

    Putkonen, M., Niinistö, J., Kukli, K., Sajavaara, T., Karppinen, M., Yamauchi, H., & Niinistö, L. (2003). ZrO2 Thin Films Grown on Silicon Substrates by Atomic Layer Deposition with Cp2Zr(CH3))2 and Water as Precursors. Chemical Vapor Deposition, 9(4), 207-212.