ZrO2 and HfO2 Thin Films from Cyclopentadienyl Precursors by Atomic Layer Deposition

Jaakko Niinistö, Matti Putkonen, Lauri Niinistö

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publicationAVS International Topical Conference, Atomic Layer Deposition: ALD 2003, San Jose, CA, USA 2 August 2003
    Publication statusPublished - 2003
    MoE publication typeA4 Article in a conference publication

    Keywords

    • atomic layer deposition
    • cyclopentadienyl precursors
    • thin films

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