ZrO2In2O3 thin layers with gradual ionic to electronic composition synthesized by atomic layer deposition for SOFC applications

Cyrine Brahim, Florent Chauveau, Armelle Ringuedé, Michel Cassir, Matti Putkonen, Lauri Niinistö

Research output: Contribution to journal › Article › Scientific › peer-review

24 Citations (Scopus)

Original language	English
Pages (from-to)	760-766
Journal	Journal of Materials Chemistry
Volume	19
Issue number	6
Publication status	Published - 2009
MoE publication type	A1 Journal article-refereed

Cite this

@article{ec542f644fac4efca9f5230fd7874a81,

title = "ZrO2In2O3 thin layers with gradual ionic to electronic composition synthesized by atomic layer deposition for SOFC applications",

author = "Cyrine Brahim and Florent Chauveau and Armelle Ringued{\'e} and Michel Cassir and Matti Putkonen and Lauri Niinist{\"o}",

year = "2009",

language = "English",

volume = "19",

pages = "760--766",

journal = "Journal of Materials Chemistry",

issn = "0959-9428",

number = "6",

}

In: Journal of Materials Chemistry, Vol. 19, No. 6, 2009, p. 760-766.

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - ZrO2In2O3 thin layers with gradual ionic to electronic composition synthesized by atomic layer deposition for SOFC applications

AU - Brahim, Cyrine

AU - Chauveau, Florent

AU - Ringuedé, Armelle

AU - Cassir, Michel

AU - Putkonen, Matti

AU - Niinistö, Lauri

PY - 2009

Y1 - 2009

M3 - Article

VL - 19

SP - 760

EP - 766

JO - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

SN - 0959-9428

IS - 6

ER -