X-ray reflectivity characterization of atomic layer deposition Al2O3/TiO2 nanolaminates with ultrathin bilayers

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  • VTT Technical Research Centre of Finland

Abstract

Nanolaminate structures have many prospective uses in mechanical, electrical, and optical applications due to the wide selection of materials and precise control over layer thicknesses. In this work, ultrathin Al2O3/TiO2 nanolaminate structures deposited by atomic layer deposition from Me3Al, TiCl4, and H2O precursors with intended bilayer thicknesses ranging from 0.1 to 50 nm were characterized by x-ray reflectivity (XRR) measurements. The measurements were simulated to obtain values for thickness, density, and roughness of constituting layers. XRR analysis shows that the individual layers within the nanolaminate remain discrete for bilayers as thin as 0.8 nm. Further reduction in bilayer thickness produces a composite of the two materials.

Details

Original languageEnglish
Article number01A111
Pages (from-to)1-4
Number of pages4
JournalJOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A
Volume32
Issue number1
Publication statusPublished - 2014
MoE publication typeA1 Journal article-refereed

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