X-ray topography studies of dislocation distributions in Si during rapid thermal diffusion

D. Lowney, P. McNally, M. Nolan, T. Perova, T. Tuomi, R. Rantamäki, A.N. Danilewsky

    Research output: Working paperProfessional

    Original languageEnglish
    Pages86
    Publication statusPublished - 2000
    MoE publication typeD4 Published development or research report or study

    Publication series

    NameHASYLAB Users' Meeting 2000, Hamburg, Germany, January 28

    Keywords

    • diffusion
    • dislocations
    • silicon
    • synchrotron
    • x-ray topography

    Cite this