@techreport{4c11b7e2a4f14455851420dd6cc49417,
title = "X-ray topography studies of dislocation distributions in Si during rapid thermal diffusion",
keywords = "diffusion, dislocations, silicon, synchrotron, x-ray topography, diffusion, dislocations, silicon, synchrotron, x-ray topography, diffusion, dislocations, silicon, synchrotron, x-ray topography",
author = "D. Lowney and P. McNally and M. Nolan and T. Perova and T. Tuomi and R. Rantam{\"a}ki and A.N. Danilewsky",
year = "2000",
language = "English",
series = "HASYLAB Users' Meeting 2000, Hamburg, Germany, January 28",
pages = "86",
type = "WorkingPaper",
}