X-ray topography studies of dislocation distributions in Si during proximity thermal diffusion

D. Lowney, P.J. McNally, M. Nolan, T. Perova, Turkka Tuomi, R. Rantamäki, A.N. Danilewsky

    Research output: Working paperProfessional

    Original languageEnglish
    Place of PublicationHampuri
    Publication statusPublished - 2000
    MoE publication typeD4 Published development or research report or study

    Publication series

    NameHASYLAB-DESY Annual Report 1999, Part I


    • dislocations
    • silicon
    • synchrotron x-ray topography

    Cite this