White beam synchrotron x-ray topography studies of copper interconnect inducec strain in Si ic processing

J. Kanatharana, P.J. McNally, T. Tuomi, B.H.W. Toh, D. McNeill, W.M. Chen, J. Riikonen, L. Knuuttila, J.J. Pérez-Camacho

    Research output: Working paperProfessional

    Original languageEnglish
    Place of PublicationHampuri
    Publication statusPublished - 2002
    MoE publication typeD4 Published development or research report or study

    Publication series

    NameHASYLAB-DESY Annual Report 2001, Part I


    • semiconductors
    • synchrotron x-ray topography

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