Vacancy Engineering by He Induced Nanovoids in Crystalline Si

Simo Kilpeläinen, Katja Kuitunen, Filip Tuomisto, Jonatan Slotte, E. Bruno, S. Mirabella, F. Priolo

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
Article number015005
Pages (from-to)1-4
Number of pages4
JournalSemiconductor Science and Technology
Volume24
Issue number1
DOIs
Publication statusPublished - 5 Dec 2009
MoE publication typeA1 Journal article-refereed

Keywords

  • boron
  • He implantation
  • positron annihilation
  • silicon
  • vacancy cluster

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